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Silica Nano-particle Anneal Treatment and Its Effect on Chemical Mechanical Polishing
Junning Chen,Shibin Lu,Haibo Wang,Ying Meng,Feifei Wang,Min Fan 대한전기학회 2019 Journal of Electrical Engineering & Technology Vol.14 No.1
Introduction: Chemical mechanical polishing is the only one technology to obtain global planarization, which is widely applied to polish silicon, copper dual damascene structure, high/low K dielectric materials, tungsten plugs, poly-silicon gates and shallow trench isolation structure. SiO2 is widely used as abrasive for its superior properties like stability, suspension property and low viscosity There are lots of studies on silica properties. However, the detailed silica surface, inner characteristic and its effect on polishing performance are still unclear. we must also explore the silica nano-particle tiny structure difference, so we designed an experiment that we anneal the colloid silica and re-dispersed it to analyze the variety of particles properties and its influences on CMP performance. Materials: The water glass was purchased from the market. KOH (90%) and H2SO4 (98%) were purchased commercially from Shanghai Aladdin Bio-Chem technology Co., Ltd. All reagents were of analytical grade and used without further purification. Method: Diluted KOH or H2SO4 were added to 1 wt% annealed silica slurry to adjust pH value to 11.0. The slurry was milled in the polishing process. Arsenic doped 4 inch (100) silicon wafer was used to polish. The structural and morphological evolution of silica nano-particles induced by heat treatment are studied by scanning electron microscopy (SEM), X-Ray diffraction (XRD), Fourier transform infrared spectrum (FTIR), differential thermal (DTA) and thermal gravimetric analysis (TGA), which disclose the external and internal structure.
The Acetylation Level of rDNA in Brassica campestris
Zhengming Qiu,Lu Zhang, Yong Hu,Shibin He,Lijia Li 한국식물학회 2012 Journal of Plant Biology Vol.55 No.4
Ribosomal DNA is an important repeated sequence that forms the nucleolus at the interphase. Its transcription into ribosomal RNA for ribosome biogenesis also represents a transitional point for several cellular processes, including cell-cycle progression, gene-silencing,and formation of the ribonucleoprotein complex. The levels of rDNA acetylation have an important role in regulating structural changes in rDNA chromatin and transcriptional activity. Using root-tip samples from Brassica campestris, we determined that some rDNA chromatin is located in the heterochromatin regions while some is de-condensed and found in euchromatin regions. Immuno-staining results showed that histone H4K5acetylation and H4 tetra-acetylation signals are dispersed within the euchromatin. Analysis of the promoter and exon regions of rDNA via chromatin immuno-precipitation (ChIP) revealed a connection between histone acetylation and rDNA conformation.
Study of Several Silica Properties Influence on Sapphire CMP
Haibo Wang,Zhongxiang Zhang,Shibin Lu 대한전기학회 2018 Journal of Electrical Engineering & Technology Vol.13 No.2
Colloid silica using as abrasive for polishing sapphire has been extensively studied, which mechanism has also been deeply discussed. However, by the requirement of application enlargement and cost reduction, some new problems appear such as silica service life time, particle diameter mixing, etc. In this paper, several influences of colloid silica usage on sapphire CMP are examined. Results show particle diameter and concentration, pH value, service life time, particle diameter mixing heavily influence removal rate. Further analysis discloses there are two main effect aspects which are quantity of hydroxyl group, contact area for abrasive density stacking between abrasive and sapphire. Based on the discussions, a dynamic process of sapphire polishing is proposed.
Study of Several Silica Properties Influence on Sapphire CMP
Wang, Haibo,Zhang, Zhongxiang,Lu, Shibin The Korean Institute of Electrical Engineers 2018 Journal of Electrical Engineering & Technology Vol.13 No.2
Colloid silica using as abrasive for polishing sapphire has been extensively studied, which mechanism has also been deeply discussed. However, by the requirement of application enlargement and cost reduction, some new problems appear such as silica service life time, particle diameter mixing, etc. In this paper, several influences of colloid silica usage on sapphire CMP are examined. Results show particle diameter and concentration, pH value, service life time, particle diameter mixing heavily influence removal rate. Further analysis discloses there are two main effect aspects which are quantity of hydroxyl group, contact area for abrasive density stacking between abrasive and sapphire. Based on the discussions, a dynamic process of sapphire polishing is proposed.
Hongyou Li,Kaifeng Huang,Hanmei Du,Hongling Wang,Xin Chen,Shibin Gao,Hailan Liu,Moju Cao,Yanli Lu,Tingzhao Rong,Su-Zhi Zhang 한국식물학회 2016 Journal of Plant Biology Vol.59 No.6
Gro/Tup1 proteins act as negative transcriptional regulators and play crucial roles in many growth and developmental processes in a wide range of organisms. However, our understanding of Gro/Tup1 protein functions in plants is confined to the model plant Arabidopsis. Here, 11 Gro/Tup1 genes, which were characterized by the typical LisH and WD40 repeat domains, were identified in maize through a genome-wide survey. A phylogenetic analysis revealed that maize Gro/Tup1 proteins could be divided into three subfamilies, in which members shared similar protein and gene structures. The predicted maize Gro/Tup1 genes were distributed on seven chromosomes and segmental duplication contributed to their expansion. Many predicted cis-elements associated with hormones, biotic- or abioticstress responses, meristem and seed development, and circadian rhythms, were found in their putative promoter regions. A potential associated protein analysis identified a large number of candidates, including transcription factors, chromatin-modifying enzymes, protein kinases, and ubiquitinconjugating enzymes. An expression profile derived from the RNA-seq data indicated that Gro/Tup1 genes in maize were widely expressed in various organs and tissues. Quantitative real-time PCR revealed that these genes responded to at least one hormone or abiotic stress, either in roots or in shoots. Our study provides useful information on the Gro/Tup1 genes in maize and will facilitate the further functional validation of these genes in growth and development, hormone responses, and biotic- or abiotic-stress resistance.