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COMPUTER-AIDED LASER INTERFEROMETER FOR TESTING THE FLATNESS OF SILICON WAFERS
Kotlyar, V. V.,Seraphimovich, P. G.,Soifer, V. A. 대한전자공학회 1992 HICEC:Harbin International Conference on Electroni Vol.1 No.1
An optical-electronic set-up of computer-aided shift interferometer for non-contact routine testing of flatness of polished silicon wafers with diameter 200㎜ has been described. The gas He-Ne laser with the wavelenght λ=0.631㎛ and power of 15mW and collimating lens with the diameter of 250㎜ and focal lenght of 1250㎜ was used. The phase binary diffraction grating is used as a splitter of a beam. The interferogram was registered as a array of 256×256×8 bits by TV-camera. The measurements of the deviation of a wafer flatness were performed in the 1-to 100㎛ band providing the accuracy up to 0.3㎛. Time of the frame processing was 1 minute when using IBM PC/AT-286 computer.