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Magnetic Properties of Antidot Patterned Co/Pd Multilayer Film
Kunbae Noh,Chulmin Choi,Hyunsu Kim,Young Oh,Jin-Yeol Kim,Daehoon Hong,Li-Han Chen,Sungho Jin IEEE 2011 IEEE transactions on magnetics Vol.47 No.10
<P>Co/Pd multilayer media with an antidot structure have been fabricated on hole-patterned Si substrates. Si nanoholes were created by dry etching using a self-assembled diblock copolymer (DBCP) pattern as an etch mask. To enhance dry etching selectivity, thin Cr film was vacuum deposited on DBCP surface at an oblique incident angle. In comparison with the Co/Pd multilayer on a flat Si substrate, the magnetic hysteresis loop of the antidot structured Co/Pd multilayer revealed an enhanced coercive force largely independent of the amount of reactive etching time, while the shape of hysteresis loop was substantially altered as a function of dry etching time. In an optimized condition, high perpendicular magnetic anisotropy was obtained while no significant parallel magnetic anisotropy was seen, which is desirable for perpendicular recording media or pseudobit-patterned media application.</P>
GUIDED NANOSTRUCTURES USING ANODIZED ALUMINUM OXIDE TEMPLATES
KUNBAE NOH,KARLA S. BRAMMER,성태연,진성호 성균관대학교(자연과학캠퍼스) 성균나노과학기술원 2011 NANO Vol.6 No.6
Long-range ordered nanoporous aluminum oxide pattern via guided anodization technique in combination with lithographic techniques has been investigated. In addition, modified anodization process can significantly change the resultant pore geometry, which will be of great interest in realizing advanced devices including biomedical and magnetic recording applications.
Chulmin Choi,Kunbae Noh,Young Oh,Cihan Kuru,Daehoon Hong,Li-Han Chen,Sy-Hwang Liou,Tae-Yeon Seong,Sungho Jin IEEE 2011 IEEE transactions on magnetics Vol.47 No.10
<P>We have investigated the magnetic M-H loop characteristics of CoCrPt-SiO<SUB>2</SUB> perpendicular recording media as influenced by nonmagnetic ion implantations. We have also developed patterned media via ion implantation using a convenient polymer nanomask approach for local control of coercivity of magnetically hard [Co/Pd]<I>n</I> multilayer film with a [Co 0.3 nm \Pd 0.8 nm] <SUB>8</SUB>/Pd 3 nm/Ta 3 nm layer structure. The CoCrPt-SiO<SUB>2</SUB> magnetic layer having perpendicular magnetic anisotropy is sputter deposited on a flat substrate. The [Co/Pd] <I>n</I> multilayer film with vertical magnetic anisotropy is deposited and the regions corresponding to the magnetic recording bit islands are coated with polymer islands using a nanoimprinting technique. Subsequent ion implantation allows patterned penetration of implanted ions into the [Co/Pd]<I>n</I> multilayer film, thus creating magnetically isolated bit island geometry while maintaining the overall flat geometry of the patterned media.</P>
JIN-YEOL KIM,,KUNBAE NOH,CHULMIN CHOI,KARLA S. BRAMMER,MARIANA LOYA,LI-HAN CHEN,SUNGHO JIN,BRAMMER 성균관대학교(자연과학캠퍼스) 성균나노과학기술원 2010 NANO Vol.5 No.2
We have shown in this paper that the self-ordered pore structure of anodic aluminum oxide (AAO) can be utilized as a basis to conveniently form large-area Al2O3 nanowire arrays on a glass surface. An aluminum oxide nanowire array has been produced by aluminum film deposition on glass followed by anodization, then simple chemical etching. The glass surface as prepared is highly superhydrophobic, with a contact angle as high as 169°. The thinness (~ 340 nm) and vertical alignment of the aluminum oxide nanowires with empty spaces in-between essentially contribute to maintaining the optical transparency of the glass substrate. Interestingly, substantially suppressed UV transmission in the ~ 300–400 nm spectrum region was observed with the presence of the Al2O3 nanowires on the glass substrate. Such a durable surface ceramic nanowire structure can be useful for producing superhydrophobic, self-cleaning glasses with a variety of potential applications such as UV protecting glass windows for high rise buildings with reduced consumption of water and cleaning chemicals for positive environmental effects.
Strongly Superhydrophobic Silicon Nanowires by Supercritical CO₂Drying
최철민,Yeoungchin Yoon,홍대훈,Karla S. Brammer,Kunbae Noh,오영,오승한,Frank E. Talke,Sungho Jin 대한금속·재료학회 2010 ELECTRONIC MATERIALS LETTERS Vol.6 No.2
This paper reports on the extremely superhydrophobic behavior of supercritical CO₂ processed silicon nanowires (SiNWs) with a contact angle in excess of ~177°. Vertically aligned silicon nanowires with 10 nm to 40nm diameter and 1 mm to 3 mm in length were obtained by electroless etching (EE) technique. The asfabricated SiNWs were superhydrophilic with no water droplet formation (zero contact angle), and were then completely transformed to an extreme superhydrophobic state when their nanoscale surface roughness is combined with trichlorosilane hydrophobic coating. The processed SiNW array was so hydrophobic that water droplets always bounced off the surface and did not allow contact angle measurements to be obtained unless the substrate was intentionally given a concave-curvature by vacuum suction. Utilization of a hydrophobically surface-treated micro-pipette syringe enabled the release of a water droplet onto this extremely superhydrophobic surface for contact angle measurement. To prevent severe nanowire agglomeration during the drying process of wet etched SiNWs, supercritical CO₂ drying was utilized, which process significantly improved the nano configuration and enhanced hydrophobicity.