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        Improving discharge uniformity of industrial-scale very high frequency plasma sources by launching a traveling wave

        Hsin-Liang Chen,Yen-Cheng Tu,Cheng-Chang Hsieh,Deng-Lain Lin,Chin-Jung Chang,Keh-Chyang Leou 한국물리학회 2016 Current Applied Physics Vol.16 No.7

        Very high frequency (VHF) PECVD has been demonstrated to be able to significantly increase the deposition rate without compromising the film quality for the manufacture of silicon heterojunction and silicon thin film solar cells. To further reduce the production costs by enhancing the throughput, larger electrode and higher frequency are often required at the same time. Nevertheless, raising frequency in large-area PECVD results in non-uniform discharge caused by the standing wave effect and deteriorates the processing uniformity. In this study, a technique that generates a traveling wave via superposing two specific standing waves launched simultaneously is proposed to resolve this issue. An industrial-scale linear plasma reactor with length and width of 125 and 10 cm, respectively, is adopted for experimental tests and two 80 MHz power supplies are utilized to separately control the standing waves. The experimental results show that the discharge gap is only partially covered by plasma discharge when only one standing wave is applied. However, as both standing waves are launched, the non-uniformity of plasma discharge can be effectively reduced to <±5%. In addition, numerical simulation is also conducted in this study to clarify whether the proposed technique can be applied to large-area rectangular PECVD (substrate size: 1.4 m 1.1 m). By arranging multiple feeding points on opposite sides of the powered electrode, the simulation results indicate the non-uniformity of electric field can be maintained within ±10%.

      • Self-organized multi-layered graphene-boron-doped diamond hybrid nanowalls for high-performance electron emission devices

        Sankaran, Kamatchi Jothiramalingam,Ficek, Mateusz,Kunuku, Srinivasu,Panda, Kalpataru,Yeh, Chien-Jui,Park, Jeong Young,Sawczak, Miroslaw,Michałowski, Paweł Piotr,Leou, Keh-Chyang,Bogdanowicz, Robert,Li The Royal Society of Chemistry 2018 Nanoscale Vol.10 No.3

        <P>Carbon nanomaterials such as nanotubes, nanoflakes/nanowalls, and graphene have been used as electron sources due to their superior field electron emission (FEE) characteristics. However, these materials show poor stability and short lifetimes, which prevent their use in practical device applications. The aim of this study was to find an innovative nanomaterial possessing both high robustness and reliable FEE behavior. Herein, a hybrid structure of self-organized multi-layered graphene (MLG)-boron doped diamond (BDD) nanowall materials with superior FEE characteristics was successfully synthesized using a microwave plasma enhanced chemical vapor deposition process. Transmission electron microscopy reveals that the as-prepared carbon clusters have a uniform, dense, and sharp nanowall morphology with sp<SUP>3</SUP> diamond cores encased by an sp<SUP>2</SUP> MLG shell. Detailed nanoscale investigations conducted using peak force-controlled tunneling atomic force microscopy show that each of the core-shell structured carbon cluster fields emits electrons equally well. The MLG-BDD nanowall materials show a low turn-on field of 2.4 V μm<SUP>−1</SUP>, a high emission current density of 4.2 mA cm<SUP>−2</SUP> at an applied field of 4.0 V μm<SUP>−1</SUP>, a large field enhancement factor of 4500, and prominently high lifetime stability (lasting for 700 min), which demonstrate the superiority of these materials over other hybrid nanostructured materials. The potential of these MLG-BDD hybrid nanowall materials in practical device applications was further illustrated by the plasma illumination behavior of a microplasma device with these materials as the cathode, where a low threshold voltage of 330 V (low threshold field of 330 V mm<SUP>−1</SUP>) and long plasma stability of 358 min were demonstrated. The fabrication of these hybrid nanowalls is straight forward and thereby opens up a pathway for the advancement of next-generation cathode materials for high brightness electron emission and microplasma-based display devices.</P>

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