http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
Effect of nitrogen doping on nanomechanical and surface properties of silicon film
Te-Hua Fang,Win-Jin Chang,Shao-Hui Kang,Jia-Hung Liou 한국물리학회 2009 Current Applied Physics Vol.9 No.6
The effect of nitrogen ion implantation on the nanomechanical properties of single crystal Si was evaluated by means of a conventional Vickers indentation and nanoindentation tests. The images of Si surfaces before and after nitrogen implantation were observed and their average surface roughnesses were measured by an atomic force microscope (AFM), while the changes in the morphology and microstructure of the single crystal Si by N implantation were examined by field emission scanning electron microscope (SEM) and X-ray diffractometer (XRD). In addition, the hydrophilic/hydrophobic surface property of the N-doping Si film was determined from the measurement of water contact angle by the sessile drop technique. Furthermore, the effects of the doping energy on the surface contact angle and the surface roughness and the Vickers hardness of the film are also investigated. The effect of nitrogen ion implantation on the nanomechanical properties of single crystal Si was evaluated by means of a conventional Vickers indentation and nanoindentation tests. The images of Si surfaces before and after nitrogen implantation were observed and their average surface roughnesses were measured by an atomic force microscope (AFM), while the changes in the morphology and microstructure of the single crystal Si by N implantation were examined by field emission scanning electron microscope (SEM) and X-ray diffractometer (XRD). In addition, the hydrophilic/hydrophobic surface property of the N-doping Si film was determined from the measurement of water contact angle by the sessile drop technique. Furthermore, the effects of the doping energy on the surface contact angle and the surface roughness and the Vickers hardness of the film are also investigated.