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적외선 렌즈용 Ge-Sb-Se계 칼코게나이드의 유리안정성 평가
정건홍,공헌,여종빈,이현용,Jung, Gun-Hong,Kong, Heon,Yeo, Jong-Bin,Lee, Hyun-Yong 한국전기전자재료학회 2017 전기전자재료학회논문지 Vol.30 No.4
Thermal and structural stability in the glass transition region of chalcogenide glasses has been investigated in terms of thermodynamics for application to various optoelectronic devices. In this study, the compositions of $Ge_xSb_{20}Se_{80-x}$ (x = 10, 15, 20, 25, and 30) were selected to investigate the glass stability according to germanium ratios. The chalcogenide bulks were fabricated by using a traditional melt-quenching method. Thin films were deposited by a thermal evaporation system, maintaining the deposition ratio of $3{\sim}5{\AA}$ in order to have uniformity. The thermal and structural properties were measured by a differential scanning calorimeter (DSC) and X-ray diffraction (XRD). The DSC analysis provided thermal parameters and theoretical glass region stabilities. The XRD analysis supported the theoretical stabilities because of where the crystallization peak data occurred.
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비정질 텔루륨 산화물 박막 특성에 미치는 O2/Ar 가스비율의 영향
공헌,정건홍,여종빈,이현용 한국전기전자재료학회 2017 전기전자재료학회논문지 Vol.30 No.5
텔루륨 산화물 박막은 TeO2와 Te 타겟을 활용하여 다양한 산소/아르곤 가스비율에 따라 스퍼터링 기법으로 성막되었다. XRD 결과는 텔루륨 산화물 박막이 비정질로 제작되었음을 보였다. 텔루륨 산화물 박막의 구조 및 화학조성비는 FT-IR과 XPS에 의해 연구되었다. 또한 산화물 박막의 광학 특성은 Ellipsometer와 UV-VIS-NIR로 연구되었다. 산소/아르곤 가스비율이 증가할수록, 텔루륨 산화물의 원자구성비는 두 영역(x=1-2, 2-3)으로 구분되었다. 텔루륨 산화물 박막의 광학특성은 두 영역에서 다른 특성을 보였다. 산소/아르곤 가스비율이 증가함에 따라, 굴절률은 감소하였으며, 광 밴드갭은 증가하는 경향을 보였다. TeOx thin films were deposited at various O2/Ar gas-flow ratios by a reactive RFmagneton sputteringtechnique from TeO2 and Te targets. X-ray diffraction (XRD) results revealed that the TeOx thin films wereamorphous. The structure and chemical composition of the TeOx thin films were investigated by fourier transforminfrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS). The optical characteristics of the TeOxthin films were investigated by an Ellipsometer and a UV-VIS-NIR spectrophotometer. According to the O2/Argas-flow ratios, the atomic composition ratio of TeOx thin films was divided into two regions(x=1-2, 2-3). Differentoptical characteristics were shown in each region. With an increasing O2/Ar gas-flow ratio, the refractive index ofthe TeOx thin films decreased and the optical bandgap of the films increased.
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비정질 텔루륨 산화물 박막 특성에 미치는 O<sub>2</sub>/Ar 가스비율의 영향
공헌,정건홍,여종빈,이현용,Kong, Heon,Jung, Gun-Hong,Yeo, Jong-Bin,Lee, Hyun-Yong 한국전기전자재료학회 2017 전기전자재료학회논문지 Vol.30 No.5
$TeO_x$ thin films were deposited at various $O_2$/Ar gas-flow ratios by a reactive RFmagneton sputtering technique from $TeO_2$ and Te targets. X-ray diffraction (XRD) results revealed that the $TeO_x$ thin films were amorphous. The structure and chemical composition of the $TeO_x$ thin films were investigated by fourier transform infrared spectroscopy (FT-IR) and X-ray photoelectron spectroscopy (XPS). The optical characteristics of the $TeO_x$ thin films were investigated by an Ellipsometer and a UV-VIS-NIR spectrophotometer. According to the $O_2$/Ar gas-flow ratios, the atomic composition ratio of $TeO_x$ thin films was divided into two regions(x=1-2, 2-3). Different optical characteristics were shown in each region. With an increasing $O_2$/Ar gas-flow ratio, the refractive index of the $TeO_x$ thin films decreased and the optical bandgap of the films increased.
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