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李學智 효성여자대학교 한국전통문화연구소 1999 韓國傳統文化硏究 Vol.13 No.-
斤數十年來, 大陸地區對古代中國境內許多非漢族之各兄弟民族語言ㆍ文字, 硏究的頗爲積極而成績斐然. 其中我們最感興趣者, 莫過于金光平先生及其哲嗣金啓孮父子, 硏究明代四夷館遺留下來的「女眞譯語」及「女眞館來文」二書中的金ㆍ明兩朝的「女眞族語文」了. 當然, 金氏父子在內蒙古大學學報, 以及韓國曉星女子大學「韓國傳統文化硏究」等刋物上發表過許多有關「女眞文字」硏究之論文. 但總其硏究成果的兩部巨著, 似應是一九八十年北京文物出版社印行的金光平, 金啓孮合著之「女眞語文文字硏究」一書, 以及一九八四年北京文物出版社發行的金啓孮編著之「女眞文辭典」一巨冊了.
입자추적 유동해석을 이용한 초음파분무화학기상증착 균일도 예측 연구
하주환,박소담,이학지,신석윤,변창우,Ha, Joohwan,Park, Sodam,Lee, Hakji,Shin, Seokyoon,Byun, Changwoo 한국반도체디스플레이기술학회 2022 반도체디스플레이기술학회지 Vol.21 No.3
Mist-CVD is known to have advantages of low cost and high productivity compared to ALD and PECVD methods. It is capable of reacting to the substrate by misting an aqueous solution using ultrasonic waves under vacuum-free conditions of atmospheric pressure. In particular, Ga<sub>2</sub>O<sub>3</sub> is regarded as advanced power semiconductor material because of its high quality of transmittance, and excellent electrical conductivity through N-type doping. In this study, Computational Fluid Dynamics were used to predict the uniformity of the thin film on a large-area substrate. And also the deposition pattern and uniformity were analyzed using the flow velocity and particle tracking method. The uniformity was confirmed by quantifying the deposition cross section with an FIB-SEM, and the consistency of the uniformity prediction was secured through the analysis of the CFD distribution. With the analysis and experimental results, the match rate of deposition area was 80.14% and the match rate of deposition thickness was 55.32%. As the experimental and analysis results were consistent, it was confirmed that it is possible to predict the deposition thickness uniformity of Mist-CVD.
Ga2O3초음파분무화학기상증착 공정에서 유동해석을 이용한 균일도 향상 연구
변창우,하주환,이학지,박소담,신석윤 한국반도체디스플레이기술학회 2022 반도체디스플레이기술학회지 Vol.21 No.4
Mist-CVD is known to have advantages of low cost and high productivity method since the precursor solution is misting with an ultrasonic generator and reacted on the substrate under vacuum-free conditions of atmospheric pressure. However, since the deposition distribution is not uniform, various efforts have been made to derive optimal conditions by changing the angle of the substrate and the position of the outlet to improve the result of the preceding study. Therefore, in this study, a deposition distribution uniformity model was derived through the shape and position of the substrate support and the conditions of inlet flow rate using the particle tracking method of computational fluid dynamics (CFD). The results of analysis were compared with the previous studies through experiment. It was confirmed that the rate of deposition area was improved from 38.7% to 100%, and the rate of deposition uniformity was 79.07% which was higher than the predicted result of simulation. Particle tracking method can reduce trial and error in experiments and can be considered as a reliable prediction method.