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최원석(Wonseok Choi),이형서(Hyeongseo Lee),박호진(Hojin Park),이시형(Sihyeung Lee),정상엽(Sangyeop Jeong),장은이(Eunei Jang),길유창(Yuchang Gil),고수한(Suhan Ko) 한국추진공학회 2023 한국추진공학회 학술대회논문집 Vol.2023 No.5
The purpose of this study is to design an Ethanol/H₂O₂ small liquid rocket. The target altitude is 100m, the combustion time is 4 seconds, and the target thrust is 450 N, with a combustion chamber pressure of 15 bar and an O/F ratio of 2, and a design I<SUB>sp</SUB> of 290 s. The combustion chamber has an inner diameter of Ø60 and a height of 250 mm, and the characteristic length of the chamber is 3.2 m. A Swirl coaxial injector is used, with oxidizer injected internally and fuel injected externally. The propellant supply method uses a pressurized propellant supply method, with nitrogen used as the pressurizing gas. A torch ignition system is used, with methane and gaseous oxygen used as the fuel and oxidizer, respectively, and flow rate controlled by an orifice. After confirming the engines performance based on the designed values, there are plans to conduct test flights.
이시형,이해원,정상배,김응렬 漢陽大學校 自然科學硏究所 1996 自然科學論文集 Vol.15 No.-
노블락 레진은 반도체 미세 가공공정에 쓰이는 포토레지스트의 기본 물질로서 높은 열안정성과 에칭내성으로 인하여 상당한 산업적 중요성을 지니고 있다. 본 연구에서는 다양한 조건에서 m-cresol, p-cresol, formaldehyde로 노블락 레진을 합성하였으며, 노블락 레진을 광산발생제, 가교제와 배합하여 네가형 포토레지스트를 제조하고, i-line 노광장치를 이용하여 패턴형성실험을 수행하였다. 노광에 의한 가교반응은 FT-IR을 이용하여 측정하였다. Novolak resin is widely used in semiconductor microlithography and it has a considerably industrial importance due to its high thermal stability and etching resistance. In this experiment, we synthesized novolak resin with m-cresol, p-cresol and formaldehyde by condensation. Photoresist was formulated using novolak resin, photo acid generator(PAG), and crosslinker. Pattern formulation was carried out by using i-line exposing apparatus. Crosslinking reaction by exposure was measured by FT-IR.