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진공 환경에서 가열되는 반도체 웨이퍼로의 입자 침착에 관한 수치해석적 연구
박수빈,유경훈,이건형,Park, Su-Bin,Yoo, Kyung-Hoon,Lee, Kun-Hyung 한국입자에어로졸학회 2018 Particle and Aerosol Research Vol.14 No.2
Numerical analysis was conducted to characterize particle deposition onto a heated horizontal semiconductor wafer in vacuum environment. In order to calculate the properties of gas surrounding the wafer, the gas was assumed to obey the ideal gas law. Particle transport mechanisms considered in the present study were convection, Brownian diffusion, gravitational settling and thermophoresis. Averaged particle deposition velocities on the upper surface of the wafer were calculated with respect to particle size, based on the numerical results from the particle concentration equation in the Eulerian frame of reference. The deposition velocities were obtained for system pressures of 1000 Pa~1 atm, wafer heating of 0~5 K and particle sizes of $2{\sim}10^4nm$. The present numerical results showed good agreement with the available experimental ones.
클린룸 환경에서 가열되는 회전 반도체 웨이퍼로의 입자침착 수치해석
송근수(Gun-Soo Song),유경훈(Kyung-Hoon Yoo),이건형(Kun-Hyung Lee) 한국실내환경학회 2006 한국실내환경학회지 Vol.3 No.2
Numerical analysis was conducted to characterize particle deposition on a heated rotating semiconductor wafer with respect to wafer diameter. The particle transport mechanisms considered in this study were convection, Brownian diffusion, gravitational settling, and thermophoresis. The averaged particle deposition velocities and their radial distributions on the upper surface of the wafer were calculated from the particle concentration equation in an Eulerian frame of reference at rotating speeds of 0 and 1000 rpm, wafer diameters of 100, 300 ㎜ and wafer heating of △T=0 and 5K. It was observed from the numerical results that the averaged deposition velocities on the upper surface increase, when the wafer diameter confirms increase. The comparison of the present numerical results with the available experimental results showed relatively good agreement between different studies.
반도체 클린룸의 피드백 제어방식에 따른 실내온도 과도응답 및 에너지소비 평가
송근수(Geun-Soo Song),정준수(Jun-Soo Jung),정동호(Dong-Ho Jeong),김영규(Young-Gyu Kim),양지석(Ji-Seok Yang),김춘식(Chun-Sik Kim),박형진(Hyung-Jin Park),이건형(Kun-Hyung Lee),유경훈(Kyung-Hoon Yoo) 대한설비공학회 2022 대한설비공학회 학술발표대회논문집 Vol.2022 No.6
This paper presents the transient responses of indoor temperature and the energy consumptions of various feedback control schemes for a typical semiconductor cleanroom. The control schemes include ON/OFF, PID, ANN and MPC controls with saturation capabilities. Control block diagrams with the platform of MATLAB/Simulink are developed for an indoor temperature control with constant humidity ratio in the cleanroom. The simulation results showed that the properly tuned PID control scheme with saturation was more energy efficient than the other schemes were. However using ANN and MPC controllers would give the faster response with comparison to PID controllers and give the zero overshoot output.