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플라즈마 공중합 고분자 절연막과 펜타센 반도체막의 계면특성
신백균(Paik-Kyun Shin),임헌찬(H-C Lim),육재호(J-H Yuk),박종관(J-K Park),조기선(G-S Jo),남광우(K-Y Nam),박종국(J-K Park),김용운(Y-W Kim),정무영(M-Y Chung) 대한전기학회 2009 대한전기학회 학술대회 논문집 Vol.2009 No.7
Thin films of pp(ST-Co-VA) were fabricated by plasma deposition polymerization (PVDPM) technique. Properties of the plasma polymerized pp(ST-Co-VA) thin films were investigated for application to semiconductor device as insulator. Thickness, dielectric property, composition of the pp(ST-Co-VA) thin films were investigated considering the relationship with preparation condition such as gas pressure and deposition time. In order to verify the possibility of application to organic thin film transistor, a pentacene thin film was deposited on the pp(ST-Co-VA) insulator by vacuum thermal evaporation technique. Crystalline property of the pentacene thin film was investigated by XRD and SEM, FT-IR. Surface properties at the pp(ST-Co-VA)/pentacene interface was investigated by contact angle measurement. The pp(ST-Co-VA) thin film showed a high-k (k=4.6) and good interface characteristic with pentacene semiconducting layer, which indicates that it would be a promising material for organic thin film transistor (OTFT) application.
임재성(J.S. Lim),신백균(P.K. Shin),남광우(K.Y. Nam),김진식(J.S. Kim),황명환(M.H. Hwang),김종택(J.T. Kim),이은학(Y.H. Lee),강대하(D.H. Kang) 대한전기학회 2006 대한전기학회 학술대회 논문집 Vol.2006 No.7
In this paper, poly methyl methacrylate thin films were deposited on a ITO glass substrate using a plasma polymerization technique. In order to investigate the influence of the plasma coupling method and plasma conditions on the plasma polymerized poly methyl methacrylate (ppMMA) thin film properties, inductively coupled (ICP) and capacitively coupled plasma (CCP) were used to generate the plasma and the plasma parameters were varied. Molecular structures of the ppMMAs were investigated using a Fourier Transform Infrared (IT-IR) spectroscopy. Dielectric constants of the ppMMA thin films were investigated using a impedance anaiyzer (HP4192A, LF Impedance Analyzer). Current-Voltage (I-V) characteristics of the ppMMA thin films were investigated using a source measurement unit (SMU : Keithley 2400). Relationship between the plasma coupling technique/process parameter and ppMMA thin films properties were investigated.
임영택(Young-Taik Lim),신백균(Paik-Kyun Shin),조기선(K-S Cho),박종관(J-K Park),남광우(K-W Nam),이능헌(N-H Lee),임경범(K-B Lim),정무영(M-Y Cheong),송진호(J-H Song) 대한전기학회 2010 대한전기학회 학술대회 논문집 Vol.2010 No.7
유기전자소자(Organic-TFT 및 Organic-Memory)용 유전체 고분자박막은 높은 유전상수 및 전계강도와 우수한 표면 및 벌크특성을 요구하고 있다. 자체 제작한 13.56[㎒] RF플라즈마 중합장비를 이용하여 정전 결합 플라즈마(CCP) 방법으로 가교된 ppTh(plasma polymerization Thiophene) 박막을 제작하였다. ppTh박막의 유전 및 절연 특성은 알루미늄/ppTh/알루미늄 구조의 콘덴서를 제작하고 측정하였다.