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A new gas jet type Z-pinch extreme ultraviolet light source for next generation lithography
송인호(Inho song),최창호(Changho Choi),고광철(Kwangcheol Ko),Eiki Hotta 대한전기학회 2006 대한전기학회 학술대회 논문집 Vol.2006 No.7
A new gas jet Z-pinch EUV light source having double gas jet electrodes has been developed. It has two nozzles and two diffusers. The EUV beam is collected from the side of pinch plasma, generated in between the inner nozzle and corresponding diffuser. A cylindrical shell of He gas curtain produced by the outer nozzle is specially designed for shielding the debris and suppressing the inner gas expansion. We have succeeded in generating EUV energy of 1.22 mJ/sr/2%BW/pulse at 13.5 ㎚. The estimated dimension of EUV source is to be FWHM diameter of 0.07 ㎜ and length of 0.34 ㎜, and FW l/e2 diameter of 0.15 ㎜ and length of 1.2 ㎜.