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Computational Analysis on Fluid Dynamics During the Flame Synthesis of TiO2 Nanoparticles
Piyabutr Sunsap,Kyo-Seon Kim,Dong-Joo Kim,Tawatchai Charinpanitkul,Woo-Sik Kim,Tawatchai Charinpanitkul 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.52 No.4
A computational method was used to simulate the gas temperature, velocity and species composition profiles in the diffusion flame reactor during the CH₄ combustion, the titanium-tetra-isopropoxide (TTIP) decomposition to form TiO₂ and the filtration of TiO₂ particles. The effects of various O₂ and CH₄ flow rates on the gas temperature and velocity are illustrated. An increase in the O₂ flow rate reduces slightly the flame temperature but enhances significantly the gas velocity and the heat convection rate. An increase in the CH₄ flow rate leads to an increased flame temperature and gas velocity. The deposition rate of TiO₂ particles on the filter was calculated along the height of the filter for various O₂ and CH₄ flow rates. An increase in the O₂ flow rate can enhance the deposition rate of TiO₂ particles clearly, while an increase in CH₄ flow rate decreases the deposition rate of TiO₂ particles on the filter slightly. The deposition rate increases as higher positions of the filter. A computational method was used to simulate the gas temperature, velocity and species composition profiles in the diffusion flame reactor during the CH₄ combustion, the titanium-tetra-isopropoxide (TTIP) decomposition to form TiO₂ and the filtration of TiO₂ particles. The effects of various O₂ and CH₄ flow rates on the gas temperature and velocity are illustrated. An increase in the O₂ flow rate reduces slightly the flame temperature but enhances significantly the gas velocity and the heat convection rate. An increase in the CH₄ flow rate leads to an increased flame temperature and gas velocity. The deposition rate of TiO₂ particles on the filter was calculated along the height of the filter for various O₂ and CH₄ flow rates. An increase in the O₂ flow rate can enhance the deposition rate of TiO₂ particles clearly, while an increase in CH₄ flow rate decreases the deposition rate of TiO₂ particles on the filter slightly. The deposition rate increases as higher positions of the filter.
Sunsap, Piyabutr,Kim, Dong-Joo,Charinpanitkul, Tawatchai,Kim, Kyo-Seon American Scientific Publishers 2009 Journal of Nanoscience and Nanotechnology Vol.9 No.7
<P>The computational analysis was developed to illustrate the gas temperature and velocity profiles in the oxy-methane diffusion flame reactor during the formation of TiO2 nanoparticles and the collection of the TiO2 nanoparticles by filter. The computational simulation shows that the increase in gas temperature and velocity is significantly affected by the increase in CH4 flow rate. The particle trajectory was calculated by using the model, which concerns the effects of thermophoretic force and gas velocity on the particle movement. The particles starting from different initial positions in radial direction will move in different trajectories. The particles following different trajectories have different temperature histories and also residence times in the gas phase. As the particles start at the initial position of the reactor which is further away from the central axis, they spend longer time in the gas phase and deposit on the higher position of filter. For particles starting at the initial position of the reactor which is further than 0.5 cm from the central axis, they move to deposit on the pyrex tube instead of filter. As the CH4 flow rate increases, the particles move further from the central axis, but it takes a shorter time for the particles to deposit on the filter. The particles synthesized at a higher CH4 flow rate show significantly higher temperature history than those particles synthesized at a lower CH4 flow rate. The temperature histories of particles in diffusion flame reactor can be quite important information to control the properties of TiO2 nanoparticles.</P>
Optical transmission of greenhouse film prepared from composite of polyethylene and microsilica /
Charinpanitkul, Tawatchai,Ruenjaikaen, Kridsada,Sunsap, Piyabutr,Wijitamornlert, Arthorn,Kim, Kyo Seon THE KOREAN SOCIETY OF INDUSTRIAL AND ENGINEERING 2007 JOURNAL OF INDUSTRIAL AND ENGINEERING CHEMISTRY -S Vol.13 No.6