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Laser-induced Damage of Multilayer Oxide Coatings at 248 nm
Chaoyang Wei,Hongbo He,Hongji Qi,Kui Yi,Zhengxiu Fan 한국물리학회 2011 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.58 No.42
Al_2O_3/SiO_2 and HfO_2/SiO_2 high reflection coatings for 248 nm were deposited with optimized parameters to try to elucidate the laser-induced damage mechanisms of oxide coatings for 248 nm irradiation. Qualitative differences in the laser-induced damage thresholds (LIDTs) and in the surface morphologies indicated that the dominant damage mechanisms were different for the two multilayers. The damage morphology information showed that the damage was induced by defects for the HfO_2/SiO_2 multilayers whereas the damage for Al_2O_3/SiO_2 multilayers displayed intrinsic damage characteristics that were dramatically different from those of HfO_2/SiO_2 multilayers. Quantitative analyse of the above two kinds of coatings were done. The results showed that the damage to the HfO_2/SiO_2 multilayers can be well explained by a defect model. As for the damage to the Al_2O_3/SiO_2 multilayer, a quantitative analysis based on electron production via multiphoton ionization (MPI) and impact ionization (II) was in good agreement with the assumption that the damage to the Al_2O_3/SiO_2 multilayers was induced by intrinsic nonlinear absorption.