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Development of Nanodomain and Fractal Morphologies in Solvent Annealed Block Copolymer Thin Films
Peng, Juan,Han, Yanchun,Knoll, Wolfgang,Kim, Dong Ha Hu@thig & Wepf 2007 Macromolecular Rapid Communications Vol.28 No.13
<P>We have systematically studied the thin film morphologies of asymmetric polystyrene-block-poly(ethylene oxide) (PS-b-PEO) diblock copolymer subjected to solvent vapors of varying selectivity for the constituent blocks. Upon a short treatment in neutral or PS-selective vapor, the film exhibited a highly ordered array of hexagonally packed, cylindrical microdomains. In the case of PEO selective vapor annealing, such ordered cylindrical microdomains were not obtained. Instead, fractal patterns on the microscale were observed and their growth processes investigated. Furthermore, hierarchical structures could be obtained if the fractal pattern was exposed to neutral or PS selective vapor.</P><P> <img src='wiley_img/10221336-2007-28-13-MARC200700206-gra001.gif' alt='wiley_img/10221336-2007-28-13-MARC200700206-gra001'> </P>
A Fuzzy Immune GA Scheduling Framework for JSSP
Deyin Ma,Xuming Han,Yanchun Liang,Xiaohu Shi 보안공학연구지원센터 2016 International Journal of Grid and Distributed Comp Vol.9 No.8
Focused on partly flexible job shop scheduling problems, a framework is proposed based on fuzzy immune GA scheduling method. Firstly, we develop a dispatching rule method to evaluate processing devices based on fuzzy weight according to multiple objectives. Based on the evaluation results, the devices are selected to reduce the redundant ones. Then a fuzzy immune genetic algorithm is proposed to deal with the scheduling problems, in which the fuzzified maximum average satisfaction is used to evaluate the solution. To test our proposed method, it is applied to two real job scheduling problems. Experiment results show the effectiveness of our method.
Rubo Xing,Yu Xuan,Zhe Wang,Dongge Ma,Yanchun Han 한국물리학회 2009 Current Applied Physics Vol.9 No.4
In this paper, the undercut structures were fabricated by microtransfer printing of metal films on the surface of photoresist combined with UV exposure and photoresist film developing. The patterned metal films were used as mask to realize the selective UV exposure of photoresist firstly. The undercut structures, which consist of the top metal films and the patterned bottom photoresist, formed in the subsequent developing process because of the lateral dissolving of photoresist at the edge of the unexposed regions. The method proposed in this paper has wider tolerance to the changing of the patterning parameters, but without effect on the patterning resolution since the metal film was used as the top layer. The undercut structures were used as separators to pattern passive-matrix display of organic light-emitting diodes (OLEDs). No visible difference of the device performance was observed compared with the OLEDs patterned by the shadow mask. In this paper, the undercut structures were fabricated by microtransfer printing of metal films on the surface of photoresist combined with UV exposure and photoresist film developing. The patterned metal films were used as mask to realize the selective UV exposure of photoresist firstly. The undercut structures, which consist of the top metal films and the patterned bottom photoresist, formed in the subsequent developing process because of the lateral dissolving of photoresist at the edge of the unexposed regions. The method proposed in this paper has wider tolerance to the changing of the patterning parameters, but without effect on the patterning resolution since the metal film was used as the top layer. The undercut structures were used as separators to pattern passive-matrix display of organic light-emitting diodes (OLEDs). No visible difference of the device performance was observed compared with the OLEDs patterned by the shadow mask.