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RISS 인기검색어
- 검색키워드
- 저자 : Tomizo Kurosawa (검색결과 2 건)
- 무료
- 기관 내 무료
- 유료
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Pitch Measurement of 150 nm ID-grating Standards Using an Nanometrological Atomic Force Microscope
진종한,Ichiko Misumi,Satoshi Gonda,Tomizo Kurosawa 한국정밀공학회 2004 International Journal of Precision Engineering and Vol.5 No.3
Pitch measurements of 150 nm one-dimensional grating standards were carried out using a contact mode atomic force microscopy with a high resolution three-axis laser interferometer. This measurement technique was named as the nano-metrological AFM. In the nano-metrological AFM, three laser interferometers were aligned precisely to the end of an AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I2-stabilized He-Ne laser at a wavelength of 633 nm. Therefore, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM could be used to directly measure the length standard. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement (GUM). The primary source of uncertainty in the pitch-measurements was derived from the repeatability of the pitch-measurements, and its value was about 0.186 nm. The average pitch value was 146.65 nm and the combined standard uncertainty was less than 0.262 nm. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.
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Pitch Measurement of 150 ㎚ 1D-grating Standards Using an Nano-metrological Atomic Force Microscope
Jonghan Jin,Ichiko Misumi,Satoshi Gonda,Tomizo Kurosawa 한국정밀공학회 2004 International Journal of Precision Engineering and Vol.5 No.3
Pitch measurements of 150 ㎚ one-dimensional grating standards were carried out using a contact mode atomic force microscopy with a high resolution three-axis laser interferometer. This measurement technique was named as the 'nano-metrological AFM'. In the nano-metrological AFM, three laser interferometers were aligned precisely to the end of an AFM tip. Laser sources of the three-axis laser interferometer in the nano-metrological AFM were calibrated with an I2-stabilized He-Ne laser at a wavelength of 633 ㎚. Therefore, the Abbe error was minimized and the result of the pitch measurement using the nano-metrological AFM could be used to directly measure the length standard. The uncertainty in the pitch measurement was estimated in accordance with the Guide to the Expression of Uncertainty in Measurement (GUM). The primary source of uncertainty in the pitch-measurements was derived from the repeatability of the pitch-measurements, and its value was about 0.186 ㎚. The average pitch value was 146.65 ㎚ and the combined standard uncertainty was less than 0.262 ㎚. It is suggested that the metrological AFM is a useful tool for the nano-metrological standard calibration.
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