RISS 학술연구정보서비스

검색
다국어 입력

http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.

변환된 중국어를 복사하여 사용하시면 됩니다.

예시)
  • 中文 을 입력하시려면 zhongwen을 입력하시고 space를누르시면됩니다.
  • 北京 을 입력하시려면 beijing을 입력하시고 space를 누르시면 됩니다.
닫기
    인기검색어 순위 펼치기

    RISS 인기검색어

      검색결과 좁혀 보기

      선택해제

      오늘 본 자료

      • 오늘 본 자료가 없습니다.
      더보기
      • 무료
      • 기관 내 무료
      • 유료
      • KCI등재

        Heat transfer analysis on wafer annealing process in semiconductor multi-wafer furnace using CFD simulation

        Siew Aun Tan,Kok Hwa Yu,Mohd Zulkifly Abdullah 대한기계학회 2022 JOURNAL OF MECHANICAL SCIENCE AND TECHNOLOGY Vol.36 No.6

        This study employs a three-dimensional numerical model to simulate a vertical furnace for wafer annealing process. For a conventional furnace design, it is revealed that the top 5 pieces of the stacked wafers are exposed to lower temperatures, approximately 3-5 % lower than the operating heater temperature. Temperature distribution and the heat losses from the furnace, especially on the heat dissipated through the top header and the process door of the furnace chamber, are examined. To reduce the heat losses, furnace design improvements comprised of a thicker top header and a better thermal insulated process door are recommended. With such implementations, up to 28 % and 22 % reduction of heat dissipation through the top header and the process door, respectively, could be attained. In addition, the design of the boat cover is found to influence the temperature uniformity across the stacked wafers. To attain better temperature uniformity at the top region of stacked wafers, a furnace with a full boat cover is thus recommended.

      연관 검색어 추천

      이 검색어로 많이 본 자료

      활용도 높은 자료

      해외이동버튼