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Competition of sorghum cultivars and densities with Japanese millet (Echinochloa esculenta)
Wu, Hanwen,Walker, Steven R.,Osten, Vikki A.,Robinson, Geoff The Korean Society of Weed Science and The Turfgra 2010 Weed Biology and Management Vol.10 No.3
Field studies were conducted at two locations in southern Queensland, Australia during the 2003-2004 and 2004-2005 growing seasons to determine the differential competitiveness of sorghum (Sorghum bicolor L. Moench) cultivars and crop densities against weeds and the sorghum yield loss due to weeds. Weed competition was investigated by growing sorghum in the presence or absence of a model grass weed, Japanese millet (Echinochloa esculenta). The correlation analyses showed that the early growth traits (height, shoot biomass, and daily growth rate of the shoot biomass) of sorghum adversely affected the height, biomass, and seed production of millet, as measured at maturity. "MR Goldrush" and "Bonus MR" were the most competitive cultivars, resulting in reduced weed biomass, weed density, and weed seed production. The density of sorghum also had a significant effect on the crop's ability to compete with millet. When compared to the density of 4.5 plants per $m^2$, sorghum that was planted at 7.5 plants per $m^2$ suppressed the density, biomass, and seed production of millet by 22%, 27% and 38%, respectively. Millet caused a significant yield loss in comparison with the weed-free plots. The combined weed-suppressive effects of the competitive cultivars, such as MR Goldrush, and high crop densities minimized the yield losses from the weeds. These results indicate that sorghum competition against grass weeds can be improved by choosing competitive cultivars and by using a high crop density of >7.5 plants per $m^2$. These non-chemical options should be included in an integrated weed management program for better weed management, particularly where the control options are limited by the evolution of herbicide resistance.
Wolfram Lyda,Avinash Burla,Tobias Haist,Marc Gronle,Wolfgang Osten 한국정밀공학회 2012 International Journal of Precision Engineering and Vol. No.
In this contribution the complete implementation of an automated multiscale measurement system (AMMS) for the inspection of micro lenses and micro electromechanical systems is presented. The system uses an adaptable active exploration strategy to balance the conflict between lateral resolution, axial accuracy and measurement duration. It is equipped with several sensors with different fields of view, resolutions and accuracies. The sensors are linked flexibly during the measurement process by image processing and data fusion algorithms. Image processing algorithms are used to identify defect indicators which represent possible unresolved defects in the current sensor scale. The information, gathered by the indicator algorithms, results in new regions of interest and knowledge about the specimen feature which is needed to select and to condition more finely scaled sensors, and to trigger higher resolved measurements in the next scale. For the automated adaption and parameter optimization of the system to a measurement task, an assistant system for sensor and algorithm selection is used. We present the necessary components for automatic task adaptation and active exploration of micro lenses and micro electromechanical systems (MEMS). Inspection results for MEMS-wafer and micro lens arrays and a performance analysis are discussed.