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RISS 인기검색어
- 검색키워드
- 저자 : Ningkang Huang (검색결과 3 건)
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Ningkang Huang,Yu Zou,Ding Ren,Changyong Zhan,Haiyang Dai 한국물리학회 2010 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.56 No.4
Diamond-like carbon (DLC) films were prepared by using the middle frequency pulsed unbalanced magnetron sputtering technique (MFPUMST) at different Ar pressures. The structural and the mechanical properties of the films were characterized using Raman spectra and nano-indentation tests. The Raman spectra showed that the sp3 fraction in the DLC films decreases with increasing gas pressure from 0.27 to 1.60 Pa. The mechanical properties, like the nano-hardness and the elastic recovery, for these films under different gas pressures showed the same tendency in that the nano-hardness and the elastic recovery decreased with increasing gas pressure from 0.27 to 1.60Pa. The variations in the nano-hardness and the elastic recovery could be interpreted by using the different sp3 fraction in the prepared DLC films. Also, the gas pressure had a strong influence on the bonding properties of the deposited DLC films. The mechanism for the effect of gas pressure on the sp3 fraction is discussed in this paper.
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Effects of ratio of mixed gases on the surface roughness and nano-hardness of a-C:H films
Haiyang Dai,Hui Jiang,Changyong Zhan,Ningkang Huang 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.52 No.-
Methane-argon mixed gases were used for assistance in growing hydrogenated amorphous-carbon a-C:H) films. a-C:H films on p-type (100) silicon wafers were produced by middle frequency unbalanced magnetron sputtering technique at different ratios of the methane-argon gases. These films were characterized by atomic-force microscopy, nanoindentation, and Raman spectroscopy. The experimental results reveal that the nano-hardness and surface roughness of the films increase with increasing Ar concentration from 17% to 50%, while they decreased when the Ar concentration was above 50\%. The sp³/sp² ratio increases with increasing Ar concentration from 17% to 50%, but it decreased when the Ar concentration exceeded 50%, based on the results of the measurements of Raman spectroscopy. Methane-argon mixed gases were used for assistance in growing hydrogenated amorphous-carbon a-C:H) films. a-C:H films on p-type (100) silicon wafers were produced by middle frequency unbalanced magnetron sputtering technique at different ratios of the methane-argon gases. These films were characterized by atomic-force microscopy, nanoindentation, and Raman spectroscopy. The experimental results reveal that the nano-hardness and surface roughness of the films increase with increasing Ar concentration from 17% to 50%, while they decreased when the Ar concentration was above 50\%. The sp³/sp² ratio increases with increasing Ar concentration from 17% to 50%, but it decreased when the Ar concentration exceeded 50%, based on the results of the measurements of Raman spectroscopy.
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Study on the Porosity of TiO_2 Films Prepared by Using Magnetron Sputtering Deposition
Ding Ren,Yu Zou,ChangYong Zhan,NingKang Huang 한국물리학회 2011 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.58 No.41
TiO_2 films with potential for dye-sensitized solar cells were deposited by using reactive medium frequency magnetron sputtering deposition. Two groups of films were prepared respectively by changing the oblique angle of the substrate and the total pressure. Scanning electron microscopy and spectroscopic ellipsometry measurements were used to characterize the deposited TiO<SUB>2</SUB> films. The result showed that increasing the oblique angle and increasing the total pressure were both effective in increasing the porosity of the TiO_2 films.
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