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Hadeel G. El-Shorbagy,Salah M. El-kousy,Khalid Z. Elwakeel,M.A. Abd El-Ghaffar 한국공업화학회 2021 Journal of Industrial and Engineering Chemistry Vol.100 No.-
A simple and economical method for modifying chitosan based on non-catalytic direct condensationreaction between chitosan and phenolic acids “Gallic and Caffeic acids” has been developed to producecondensation adduct resins RI and RII. The resins structure and morphology were confirmed by physicaland chemical tools such as FTIR, SEM, EDX, XRD elemental analysis, TGA, water regain, dissociation inacidic medium, and point of zero charge. The new resins were evaluated as silver ions adsorbents. Factorsaffecting adsorption, as well as kinetics, equilibrium, and thermal properties of adsorption, were studiedusing conventional equations. The new resins showed more efficient removal of toxic silver ions from theaqueous medium than parent chitosan polymer. The maximum adsorption capacity amounted to 67.5,300, and 278 mg/g with removal efficiency reaching 22.5%, 100%, and 92.66% for chitosan, RI, and RII;respectively at pH 6.5 and initial silver concentration 300 mg/L. The new resins showed spontaneouschemisorption toward silver ions with exothermic nature for RI, and endothermic nature for RII. The newcondensation adduct resins showed good re-use ability reaching 83% and 67% for RI and RII; respectively,by using 0.01 M nitric acid solution.
Maleic diamides as photostabilizers for polystyrene
Samira T. Rabie,M.A. Abd El-Ghaffar,Ahmed E. Ahmed,Magdy W. Sabaa 한국공업화학회 2013 Journal of Industrial and Engineering Chemistry Vol.19 No.6
Some condensation maleic diamide adducts were prepared, characterized, and evaluated as photostabilizers for polystyrene. The potency of these diamides was determined by measuring the extent of weight loss (%), formed gel as well as the average molecular weights MV of the soluble fractions of the degraded polymers. The results indicated a good stabilizing effect of these products compared with the commercial UV absorber, phenyl salicylate. FTIR spectra of both neat and photoirradiated stabilized polystyrene gave an explanation of some photodegraded products of polystyrene. A probable radical mechanism is proposed to account for the stabilizing action of the diamide derivatives as photostabilizers.