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Kyusoon Kim,Hyun Kim,Kilha Kim,Yonggyun Kim 한국응용곤충학회 2012 한국응용곤충학회 학술대회논문집 Vol.2012 No.10
Parasitism by an endoparasitoid wasp, Cotesia plutellae, results in significant immunosuppression of the diamondback moth, Plutella xylostella. Parasitized larvae significantly suffered higher susceptibility to a microbial biopesticide, Bacillus thuringiensis (Bt) than nonparasitized (NP) larvae. To find out an immunosuppressive agent causing the enhanced Bt efficacy, viral ankyrin (=vankyrin) genes encoded in C. plutellae bracovirus (CpBV) were analyzed by transient expression in NP larvae. CpBV segments containing different vankyrins were microinjected to NP larvae and expressed their encoded vankyrins. Expression of some vankyrins significantly inhibited immune response and enhanced Bt efficacy. This study suggests that expression of vankyrins suppress a cellular immune response and lose Bt tolerance of P. xylostella larvae.
Kyusoon Kim,Sunghoon Baek,Min-Jung Kim,Young-gyun Park,Sanghyun Koh,Chansik Jung,Joon-Ho Lee 한국응용곤충학회 2018 한국응용곤충학회 학술대회논문집 Vol.2018 No.10
밤과 호두는 중요한 임산 자원으로써 최근 복숭아명나방의 피해가 증가하여 재배자들이 경제적 피해를 호소하고 있다. 부여군에 위치한 밤과 호두가 서로 인접한 재배지역의 밤나무와 호두나무 116그루를 무작위로 선정하고 각 나무별로 2개의 가지를 선정하여 복숭아명 나방의 피해율을 2018년 6월부터 9월까지 총 4회 조사하였다. 그 결과 6월, 7월, 8월의 복숭아명나방 피해과는 통계적으로(p<0.05) 호두재배지역에 집중 분포를 보였으며, 9월의 경우는 임의 분포하였다. 6월부터 8월까지는 호두 재배지역에서만 복숭아명나방의 피해가 나타나 조사지역에서 복숭아명나방 피해는 양의 상관관계를 보였다(p<0.025). 그러나 9월은 밤 재배지역에서 복숭아명나방 피해가 발생하고 호두 지역에서는 새로운 피해가 나타나지 않아 통계적으로 8월 이전과는 공간적 상호관계가 없는 것으로 나타났다(0.025<p<0.975). 이러한 결과로 월동세대는 호두에서 산란하여 피해를 야기하고 이후에 발생하는 세대는 밤에서 피해를 야기할 것으로 추정된다.
Kim, Kyongjun,Park, Siyun,Seon, Jong‐,Baek,Lim, Keon‐,Hee,Char, Kookheon,Shin, Kyusoon,Kim, Youn Sang WILEY‐VCH Verlag 2011 Advanced Functional Materials Vol.21 No.18
<P><B>Abstract</B></P><P>Flexible transparent thin‐film transistors (TTFTs) have emerged as next‐generation transistors because of their applicability in transparent electronic devices. In particular, the major driving force behind solution‐processed zinc oxide film research is its prospective use in printing for electronics. Since the patterning that prevents current leakage and crosstalk noise is essential to fabricate TTFTs, the need for sophisticated patterning methods is critical. In patterning solution‐processed ZnO thin films, several points require careful consideration. In general, as these thin films have a porous structure, conventional patterning based on photolithography causes loss of film performance. In addition, as controlling the drying process is very subtle and cumbersome, it is difficult to fabricate ZnO semiconductor films with robust fidelity through selective printing or patterning. Therefore, we have developed a simple selective patterning method using a substrate pre‐patterned through bond breakage of poly(methyl methacrylate) (PMMA), as well as a new developing method using a toluene–methanol mixture as a binary solvent mixture.</P>
Kyusoon Kim,Min-Jung Kim,Kyungyoon Cho,Sunghoon Baek,Joon-Ho Lee 한국응용곤충학회 2018 한국응용곤충학회 학술대회논문집 Vol.2018 No.04
밤은 임산물 중 가장 중요한 품목 중 하나이며, 최근 복숭아명나방에 대한 피해가 급증하고 있는 상태이다. 2017년 11월 21일, 부여군에 위치한 밤 주산단지 내 밤나무 50그루를 무작위로 선정하고 각 나무별로 땅으로 낙과한 밤송이 5개를 무작위로 채집하여 복숭아명나방의 피해과와 개체수를 확인하였다. 그 결과 95% 신뢰수준에서 복숭아명 나방과 그에 의한 피해과 수는 통계적으로 집중분포를 보였으며, 밤알 수는 임의 분포하였다. 복숭아명나방은 밤알 수와 95% 수준에서 통계적으로 역 상관관계를 보여 상대적으로 큰 밤알이 선호됨을 알 수 있었고 피해과 수와는 정 상관관계를 보여 피해과가 많으면 개체수도 많이 존재하는 경향을 보였다. 이러한 결과들은 복숭아명나방의 방제전략을 구축하는데 있어 기본적인 자료로 사용될 수 있고 고려되어야 할 사항들이다.
Poly(phenanthrenequinone) as a conductive binder for nano-sized silicon negative electrodes
Kim, Sang-Mo,Kim, Myeong Hak,Choi, Sung Yeol,Lee, Jae Gil,Jang, Jihyun,Lee, Jeong Beom,Ryu, Ji Heon,Hwang, Seung Sik,Park, Jin-Hwan,Shin, Kyusoon,Kim, Young Gyu,Oh, Seung M. The Royal Society of Chemistry 2015 ENERGY AND ENVIRONMENTAL SCIENCE Vol.8 No.5
<P>3,6-Poly(phenanthrenequinone) (PPQ) is synthesized and tested as a conductive binder. The PPQ binder, formulated with nano-sized Si powder without conductive carbon, is n-doped by accepting electrons and Li<SUP>+</SUP> ions to become a mixed conductor in the first charging period. The resulting n-doped PPQ binder remains conductive thereafter within the working potential of Si (0.0–0.5 V <I>vs.</I> Li/Li<SUP>+</SUP>). Within the composite electrode, the PPQ binder is uniformly dispersed to effectively convey electrons from the current collector to the Si particles. Namely, the PPQ binder by itself plays the roles of conductive carbon and a polymer binder that are loaded in the conventional composite electrodes. Due to the highly conductive nature, the loading of the PPQ binder can be minimized down to 10 wt%, which is close to that used for practical electrode formulation, with reasonable rate and cycle performances of the nano-Si electrode.</P> <P>Graphic Abstract</P><P>The n-doped poly(phenanthrenequinone) is electrically conductive to be successfully used as the binder for nano-silicon negative electrodes. <IMG SRC='http://pubs.rsc.org/services/images/RSCpubs.ePlatform.Service.FreeContent.ImageService.svc/ImageService/image/GA?id=c5ee00472a'> </P>
Simultaneous mating disruption of two <i>Grapholita</i> species in apple orchards
Kim, Kyusoon,Park, Changgyu,Kim, Yonggyun 한국응용곤충학회 2018 Journal of Asia-Pacific Entomology Vol.2 No.1
<P><B>Abstract</B></P> <P>Two <I>Grapholita</I> species (<I>G. molesta</I> and <I>G. dimorpha</I>) cause serious losses in apple production by means of direct fruit damage and destruction. These two congeners occurred at similar seasons in the same orchards. Furthermore, the two species occurred in similar population sizes in apple orchards, though <I>G. molesta</I> occurred much more in total occurrence density than did <I>G. dimorpha</I> in a pear orchard. The two species share two major sex pheromone components, (<I>Z</I>)-8-dodecenyl acetate (<I>Z</I>8-12:Ac) and (<I>E</I>)-8-dodecenyl acetate (<I>E</I>8-12:Ac), but differ with regard to the relative mixture ratio necessary to create conditions of maximal attraction. To develop a simultaneous mating disruption (SMD), a mass ratio of 95:5 of <I>Z</I>8-12:Ac and <I>E</I>8-12:Ac was selected due to its high cross-calling activity and subsequent high mating disruption against both species. When the mixture was applied to orchards, it resulted in significant mating disruption against both species. However, mating disruption efficacy was slightly higher in <I>G. dimorpha</I> than in <I>G. molesta</I>. Application dose and dispenser type affected efficacy duration of SMD. In addition, the high density occurrence of <I>G. molesta</I> significantly reduced the SMD efficacy. Using a wax-type of dispenser, an application of SMD in 100 g per hectare dispersed in early spring recorded >90% mating disruption efficacy through the entire growing season against both <I>Grapholita</I> species.</P> <P><B>Highlights</B></P> <P> <UL> <LI> Two <I>Grapholita</I> species share major sex pheromone components. </LI> <LI> Simultaneous mating disruption (SMD) has been devised using cross-attracting sex pheromone composition. </LI> <LI> SMD application resulted in >90% mating disruption against both species. </LI> </UL> </P> <P><B>Graphical abstract</B></P> <P>[DISPLAY OMISSION]</P>
Kim, Mihee,Kim, Kyunghoon,Lee, Nae Yoon,Shin, Kyusoon,Kim, Youn Sang Royal Society of Chemistry 2007 Chemical communications Vol.2007 No.22
<P>A super-hydrophobic and highly transparent nanostructured film was fabricated <I>via</I> imprinting and conformally uniform chemical anchoring of poly(dimethylsiloxane) on a controlled nanoscopic dimension.</P> <P>Graphic Abstract</P><P>A highly transparent super-hydrophobic surface is prepared using a nanoimprint lithographic technique with a PDMS-coated flexible mold. <IMG SRC='http://pubs.rsc.org/services/images/RSCpubs.ePlatform.Service.FreeContent.ImageService.svc/ImageService/image/GA?id=b618123f'> </P>
Low-Cost Fabrication of Transparent Hard Replica Molds for Imprinting Lithography
Kim, Joohee,Kim, Mihee,Lee, Min Jung,Lee, Ji Soo,Shin, Kyusoon,Kim, Youn Sang WILEY-VCH Verlag 2009 Advanced Materials Vol.21 No.40
<B>Graphic Abstract</B> <P>A new and cost-effective replica fabrication method for transparent and hard molds used in imprinting lithography is presented. The process uses a polymer copy as a carrier. Replicated hard molds eliminate the need for direct contact between the master and the patterned polymer on the substrate, and thus reduce contamination of the master. <img src='wiley_img/09359648-2009-21-40-ADMA200803243-content.gif' alt='wiley_img/09359648-2009-21-40-ADMA200803243-content'> </P>