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김혜영(Kim, Heyoung),김은화(Kim, Eunhwa) 팬코리아영어교육학회(구 영남영어교육학회) 2012 영어교육연구 Vol.24 No.1
The purpose of this study is to examine how well Korean students are ready for self-directed language learning and how their readiness has been changed by learning English for their public school years. 1,391 Korean students were investigated on their Self-Directed Language Learning Readiness (SDLLR, H. Kim & M. Kim, 2009) across the age groups, elementary, middle, and high school groups. Their SDLLR was also compared to their selfdirected learning readiness (SDLR, H. Kim & K. Kim, 2010), modified from Guglielmino’s scale (1977) to check if there is any particular difference in learning between English and other subjects. Furthermore, this study attends to other ‘student’ factors that might influence their SDLLR, such as motivation, gender, study-abroad experience, and age to start learning English. The result shows that Korean students’ SDLLR significantly decreases as they study English longer. Surprisingly, the average scale score of SDLLR in the elementary school group was significantly higher than that in the other two groups. This decreasing pattern was also similarly shown in the SDLR measurement, but their SDLLR score was significantly lower than that of their SDLR. Motivation, gender, age to start learning English, and oversea study experience all significantly influenced their SDLLR. In conclusion, Korean students do not seem to successfully develop their language learning autonomy from their learning experience during public school years. Many students fail to hold their motivation, confidence, and responsibility in learning English. The Korean national curriculum aiming at developing the self-directed learning ability needs to be systematically reviewed and revised to achieve their ultimate goal.
Kim, Seong-Jae,Kim, Bo-Hye,Woo, Hee-Gweon,Kim, Su-Kyung,Kim, Do-Heyoung Korean Chemical Society 2006 Bulletin of the Korean Chemical Society Vol.27 No.2
The thermal decomposition of tetrakis(ethylmethylamido) titanium (TEMAT) has been investigated in Ar and $H_2$ gas atmospheres at gas temperatures of 100-400 ${^{\circ}C}$ by using Fourier Transform infrared spectroscopy (FTIR) as a fundamental study for the chemical vapor deposition (CVD) of titanium nitride (TiN) thin film. The activation energy for the decomposition of TEMAT was estimated to be 10.92 kcal/mol and the reaction order was determined to be the first order. The decomposition behavior of TEMAT was affected by ambient gases. TEMAT was decomposed into the intermediate forms of imine (C=N) compounds in Ar and $H_2$ atmosphere, but additional nitrile (RC$\equiv$N) compound was observed only in $H_2$ atmosphere. The decomposition rate of TEMAT under $H_2$ atmosphere was slower than that in Ar atmosphere, which resulted in the extension of the regime of the surface reaction control in the CVD TiN process.
One-pot synthesis and characterization of silver/polyphenylsilane hybrid nanocomposites.
Kim, Bo-Hye,Kim, So-Yeun,Kim, Myoung-Hee,Woo, Hee-Gweon,Kim, Do-Heyoung,Jun, Jin,Sohn, Honglae American Scientific Publishers 2008 Journal of nanoscience and nanotechnology Vol.8 No.10
<P>The synthesis and characterization of spherical silver/polyphenylsilane (PPS) hybrid nanocomposites were carried out. A one-step conversion of metallic salts to stable metal nanoparticles was possible by a simple and mild PPS-mediated method. TEM (transmission electron microscopy) and FE-SEM (field emission scanning electron microscopy) data confirm the formation of the hybrid nanocomposites in which large numbers of silver nanoparticles (< 30 nm) are dispersed throughout the PPS matrix. XRD (X-ray diffraction) patterns are consistent with that for fcc-typed silver. The size and processability of such nanoparticles depend on the metal to PPS ratio. The PPS with Si-H functionalities play an important role as a reducing agent and as a stabilizing agent in the formation of the silver nanostructures. In the absence of the polymer, most of the silver particles underwent macroscopic precipitation.</P>
교사연수를 위한 개방형 학습 플랫폼의 설계, 시행, 평가
김혜영 ( Kim Heyoung ),이진화 ( Lee Jin-hwa ),김지영 ( Kim Jie-young ),이효신 ( Lee Hyoshin ) 한국멀티미디어언어교육학회 2018 멀티미디어 언어교육 Vol.21 No.3
The purpose of this study is to suggest design principles of open learning platform (OLP) for teacher training based on findings driven by design-based research (DBR, Reeves 2006). SMART Teaching 3.0 (Kim, Kim, Lee, & Lee, 2016) has been designed, implemented and evaluated as a self-directed learning program for English teachers in this study. Various types of context-rich data from 149 participant teachers, such as user statistics, teacher weekly journals, interviews, and post-survey were collected, analyzed, and triangulated. Findings throughout two teacher training implementations yielded six design principles in developing an OLP that adapts a new teacher training model: 1) sufficient open contents, 2) interface considering both PC and mobile learning environment, 3) purpose-driven online interaction space, 4) short and needs-satisfying contents such as observations of teachers’ lesson, 5) technical supports for individual learning and scaffolding, and 6) utilization of OLP for multi-purpose which are informal learning with individual learners; non-formal learning in community of practice; and formal learning as a supplement of officially certified teacher training program. It is hoped that the design principles and application process be referred for reforming teacher training program and future studies.
Synthesis and characterization of poly(alkoxysilane)s catalyzed by Co/Ni colloidal nanoparticles.
Kim, Myoung-Hee,Woo, Hee-Gweon,Kim, Do-Heyoung,Yang, Kap-Seung,Kim, Bo-Hye,Ko, Young Chun,Sohn, Honglae American Scientific Publishers 2010 Journal of nanoscience and nanotechnology Vol.10 No.5
<P>Si-Si/Si-O dehydrocoupling of hydrosilanes with alcohols (1:1.5 mole ratio), catalyzed by group VIII metallocenes Cp2M' (M' = Co, Ni) which converted to Co(O)/nickel(O) colloidal nanoparticles, produced poly(alkoxysilane)s in one-pot in high yield. The hydrosilanes include p-X-C6H4SiH3 (X = H, CH3, OCH3, F), PhCH2SiH3, and (PhSiH2)2. The alcohols include MeOH, EtOH, 'PrOH, PhOH, and CF3(CF2)2CH2OH. The weight average molecular weight of the poly(alkoxysilane)s were in the range of 600 to 8100. The dehydrocoupling reactions of phenylsilane with ethanol (1:3 mole ratio) in the presence of the nanocolloid catalyst gave only triethoxyphenylsilane as product.</P>
Efficient preparation and characterization of silver-polyphenylsilane nanocomposites.
Kim, Myoung-Hee,Woo, Hee-Gweon,Shin, Joong-Hyeok,Lee, Byeong-Gweon,Kim, Do-Heyoung,Yang, Kap-Seung,Jun, Jin,Ko, Young Chun,Sohn, Honglae American Scientific Publishers 2010 Journal of Nanoscience and Nanotechnology Vol.10 No.5
<P>Silver-polyphenylsilane nanocomposites have been effectively prepared by the dehydrocoupling reaction of phenylsilane (PS, PhSiH3) to polyphenylsilane (PPS, [PhSiH]n) in the presence of silver nitrate. The one-step reduction of Ag(+1) nitrate to stable Ag(0) nanoparticles is mediated by PS, resulting in the formation of Ag-PPS composites. The Ag-PPS nanocomposites were characterized by various analytical techniques such as XRD, TEM, FE-SEM, and solid-state UV-vis. TEM and FE-SEM data clearly show that the silver nanoparticles with the size of < 20 nm are well dispersed throughout the PPS matrix in the nanocomposites. XRD patterns are consistent with those for fcc crystalline silver. The size of silver nanoparticles increased with increasing the relative molar concentration of silver salts added. It was found that in the absence of PS, most of the silver nanoparticles undergo macroscopic precipitation by aggregation, indicating that PPS is essential to stabilize the silver nanoparticles by the complexation of Si-H to the silver metal centers.</P>
Preparation of antimony films by cyclic pulsed chemical vapor deposition.
Kim, Yeon-Hong,Lim, Gyeong Taek,Kim, Bo-Hye,Ko, Hang Ju,Woo, Hee-Gweon,Kim, Do-Heyoung American Scientific Publishers 2008 Journal of nanoscience and nanotechnology Vol.8 No.10
<P>Cyclic-pulsed plasma-enhanced chemical vapor deposition (PECVD) for the formation of antimony (Sb) thin films was investigated using Sb(i-C3H7)3 and H2 plasma at temperatures of 200-275 degrees C. The effects of deposition temperature on the film properties, such as resistivity, surface roughness, and crystallinity were examined. The film growth rate (thickness/cycle) was found to be in the range of 0.10-0.5 nm/cycle. High substrate temperatures tended to promote low resistivity, high purity, and smooth surface morphology of the films, compared to low substrate temperatures. All of the deposited films were polycrystalline, with higher deposition temperatures yielding a higher crystallinity in the Sb films.</P>
Kim, Eun-Jeong,Woo, Hee-Gweon,Kim, Do-Heyoung American Scientific Publishers 2010 Journal of nanoscience and nanotechnology Vol.10 No.5
<P>This study examined the resistivity, composition and crystallinity of chemically-vapor-deposited HfN(x) films deposited using tetrakis(dimethylamido)hafnium and plasma activated hydrogen as a function of the deposition temperature. The film growth rate (thickness/cycle) ranged from 0.09-0.15 nm/cycle depending on the deposition temperature. The deposition rate was initially insensitive to the substrate temperature at 150-200 degrees C but increased significantly at higher temperatures. The carbon impurities in the films were in the range of approximately 17 to 18 at% and formed Hf-C bonds. All the deposited films were polycrystalline, regardless of the deposition conditions, with a (111) preferred orientation. High substrate temperatures tended to yield films with low resistivity that was relatively constant at temperatures above 225 degrees C.</P>
Kim, Do Heyoung,Kim, Byung Yup 한국화학공학회 2000 Korean Journal of Chemical Engineering Vol.17 No.4
Aluminum films were prepared on H₂-plasma pretreated TiN substrates at deposition temperatures of 60-250℃ by metallorganic chemical vapor deposition using dimethylethylamine alane as a precursor. The films were highly pure and the growth rates were 3-50 nm/min, where the lowest deposition temperature was 60℃. The resistivity was as low as 2.8 μΩcm. High substrate temperatures tended to favor a low resistivity and smooth surface morphology of the films, compared to films with a ow temperature at a given thickness. Numerous empty pores appeared in the A1 films deposited at a temperature below 150℃ when the film thickness exceeded 200 nm. The number of these pores tended to increase with decrease in temperature. However, in films deposited at temperatures above 200, there were no pores and the large grains were interconnected to a high degree. Higher deposition temperatures yielded a greater preference of the (111) orientation of Al films.