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        Growth of Epitaxial TiN (111) Thin Films with Low Resistivity on Si (111) by Crossed-Beam Pulsed Laser Deposition

        강수길,C. M. Rouleau 한국물리학회 2017 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.71 No.2

        Titanium nitride (TiN) thin films were grown epitaxially on Si (111) substrates by reactive pulsed laser deposition. Substrate temperatures ranged from 550 to 950 C while plume kinetic energies ranged from 46 to 154 eV. Quality of the grown films depended strongly on kinetic energy of the films than the growth temperatures. High quality film was grown at 750 C with a laser plume kinetic energy of 92 eV. Full width at half maximum for a !-scan around the TiN (111) peak and a '-scan through the TiN (002) peak were 0.3 and 0.43, respectively. The resistivity of the films was increased with increased temperatures and a room temperature resistivity of 3.8 μ -cm was obtained.

      • Edge-Controlled Growth and Etching of Two-Dimensional GaSe Monolayers

        Li, Xufan,Dong, Jichen,Idrobo, Juan C.,Puretzky, Alexander A.,Rouleau, Christopher M.,Geohegan, David B.,Ding, Feng,Xiao, Kai American Chemical Society 2017 JOURNAL OF THE AMERICAN CHEMICAL SOCIETY - Vol.139 No.1

        <P>Understanding the atomistic mechanisms governing the growth of two-dimensional (2D) materials is of great importance in guiding the synthesis of wafer-sized, single-crystalline, high-quality 2D crystals and heterostructures. Etching, in many cases regarded as the reverse process of material growth, has been used to study the growth kinetics of graphene. In this work, we explore a growth-etching-regrowth process of monolayer GaSe crystals, including single-crystalline triangles and irregularly shaped domains formed by merged triangles. We show that the etching begins at a slow rate, creating triangular, truncated triangular, or hexagonally shaped holes that eventually evolve to exclusively triangles that are rotated 60 degrees with respect to the crystalline orientation of the monolayer triangular crystals. The regrowth occurs much faster than etching, reversibly filling the etched holes and then enlarging the size of the monolayer crystals. A theoretical model developed based on kinetic Wulff construction (KWC) theory and density functional theory (DFT) calculations accurately describe the observed morphology evolution of the monolayer GaSe crystals and etched holes during the growth and etching processes, showing that they are governed by the probability of atom attachment/detachment to/from different types of edges with different formation energies of nucleus/dents mediated by chemical potential difference Ait between Ga and Se. Our growth-etching-regrowth study provides not only guidance to understand the growth mechanisms of 2D binary crystals but also a potential method for the synthesis of large, shape-controllable, high-quality single-crystalline 2D crystals and their lateral heterostructures.</P>

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