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Fabry–Perot interferometry for magnetron plasma temperature diagnostics
Britun, N,Gaillard, M,Oh, S-G,Han, J G Institute of Physics [etc.] 2007 Journal of Physics. D, Applied Physics Vol.40 No.17
<P>A confocal Fabry–Perot interferometer was utilized to study Ar–Ti, Ar–Cu and Ar–Cr dc magnetron discharges during sputtering of the corresponding metallic targets. Doppler broadening of Ar and Ti emission lines was measured in the wide range of Ar pressures and at different powers applied to the discharge. Spatial characterization of Ar and Ti line broadening through the discharge volume was also performed. Corresponding temperatures of Ar and thermalized Ti atoms were determined by Doppler broadening of the corresponding emission lines. Results show that the Ar temperature depends mainly on the working pressure in the reactor and it was found to be on average in the range 700–1300 K for the working pressure range 2–240 mTorr. The temperature of Ti was found to be about 600–800 K; it slightly increases with increasing applied power and does not depend on the working pressure in the reactor. Ar temperature measurements were verified by adding nitrogen in the discharge and by the measuring of the N<SUB>2</SUB>(<I>C</I>, <I>v</I>′ = 0 − <I>B</I>, <I>v</I>″ = 2) vibrational band shape.</P>
Britun, N,Gaillard, M,Ricard, A,Kim, Y M,Kim, K S,Han, J G Institute of Physics [etc.] 2007 Journal of Physics. D, Applied Physics Vol.40 No.4
<P>In order to characterize a nonequilibrium molecular plasma from the point of view of translational, vibrational and rotational degrees of freedom and their interaction, the characteristic temperatures of such a plasma were measured in an ICP rf reactor. Both pure nitrogen and argon–nitrogen mixture plasmas were examined for this purpose.</P><P>The experimental results of rotational (<I>T</I><SUB>r</SUB>), vibrational (<I>T</I><SUB>v</SUB>) and electron (<I>T</I><SUB>e</SUB>) temperatures are presented. Vibrational and rotational temperatures were measured as a function of nitrogen content for both E and H modes of ICP discharge using a power range of 45–200 W and pressure range of 2.6–13.3 Pa. Additionally, the pressure dependence of electron temperature in a pure nitrogen discharge was studied. Results show that rotational temperature is ≈370 K for E mode and ≈470 K for H mode and almost does not depend on either the applied rf power or the nitrogen content in the discharge. Vibrational temperature groups in the range 5000–12 000 K increase with applied rf power and constantly decay with an increase of nitrogen content. The measured values and behaviour of electron temperature are comparable with those for the positive column of the dc glow discharge. The results also prove that these three temperatures obey the classical inequality <I>T</I><SUB>e</SUB> > <I>T</I><SUB>v</SUB> > <I>T</I><SUB>r</SUB>, as well as clarifying the differences in both vibrational and rotational temperature for different modes of the ICP discharge.</P>
Gaillard, M,Britun, N,Kim, Yong M,Han, Jeon G Institute of Physics [etc.] 2007 Journal of physics. D, applied physics Vol.40 No.3
<P>This paper presents an optical diagnostic examination of dc planar magnetron discharge used for titanium deposition at 30 mTorr in argon bulk gas. The results were obtained by optical absorption (OAS) and emission (OES) spectroscopy for two distances from the target without substrate. The absolute density of titanium in the ground and metastable states at 4 cm from the target ranged, respectively, between 8 × 10<SUP>10</SUP> cm<SUP>−3</SUP> and 10<SUP>12</SUP> cm<SUP>−3</SUP> and between 6 × 10<SUP>10</SUP> cm<SUP>−3</SUP> and 3 × 10<SUP>11</SUP> cm<SUP>−3</SUP>, in the range 0.2–1.0 A. OES results were used to prepare an assumed interpretation in terms of differences in loss mechanisms, mainly by either diffusion towards the walls for all particles at 8 cm from the target or collision losses for non-radiative species at 4 cm from the target, except for the titanium ground state. This was confirmed by our results of the argon metastable density measurement at 4 cm which was constant at around 7 × 10<SUP>10</SUP> cm<SUP>−3</SUP> with discharge current.</P>
Kang, Namjun,Britun, Nikolay,Oh, Soo-ghee,Gaboriau, Freddy,Ricard, André Institute of Physics [etc.] 2009 Journal of Physics. D, Applied Physics Vol.42 No.11
<P>In an argon ICP RF discharge modulated by 1 kHz square pulses, strong emission at 549.6 nm (corresponding to the upper level Ar(6d)) was observed about 100 µs after the pulse termination in the afterglow. This emission exceeds by a factor of as much as five the duty-on cycle intensity. With simple kinetic considerations, we assigned this emission to the Penning pooling ionization of argon metastable atoms leading to the formation of <img SRC='http://ej.iop.org/images/0022-3727/42/11/112001/jphysd311174in001.gif' ALIGN='MIDDLE' ALT='{\rm Ar}_{2}^{+} '/> in the afterglow followed by electron–ion recombination producing highly excited argon atoms Ar(6d). With the addition of 1% N<SUB>2</SUB> into Ar, the emission at 549.6 nm completely disappeared in the afterglow. This disappearance could be explained by excitation transfer between Ar metastable atoms and nitrogen molecules leading to the emission of the second positive system of N<SUB>2.</SUB>.</P>
Novel Model for Film Formation in Plasma Processing
L. R. Shaginyan,J. G. Han,N. V. Britun 한국물리학회 2006 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.48 No.6
We present the results of a detailed investigation of the structure of metal films deposited from fluxes of energetic and thermalized sputtered atoms and the results of measurements of the surface temperature developing during condensation of the sputtered metal atoms. Variations in the film structure from fine-grained in the interface region to coarse-grained in the upper part of the film correlate with variations in the surface temperature measured by using an IR camera. The surface temperature being equal to the substrate temperature at the beginning of the deposition steeply increases and becomes several times higher than the substrate temperature at the end of the process. Based on these results, we developed a model explaining this effect. The basic feature of the model is the formation of a thin liquid-like hot layer, consisting of mobile atoms which exist during deposition, on the growth surface. According to the model, the film grows by a “gas!liquid!solid” rather than a “gas!solid” mechanism, which is realized provided that the film grows from energetic atoms.