http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
유입구 형상 변화에 따른 웨이퍼캐리어 내부 유동 특성 연구
전진현(J. H. Jeon),홍우(W. Hong),박정우(J. W. Park),김윤제(Y.-J. Kim) 대한기계학회 2012 대한기계학회 춘추학술대회 Vol.2012 No.11
The wafer carrier is one of the important equipments in semiconductor manufacturing process, which is used to protect the contaminants on the silicon wafer using nitrogen gas. But this device shows the nonuniform internal flow patterns due to the existing structural feature. In this study, we have numerically investigated the flow characteristics in the wafer carrier according to the change of discharge port shapes (basic model, 13-hole model, 26-hole model), using the commercial code, A&SYS CFX. Also, we compared the numerical results of the internal flow patterns with experimental ones for various operating conditions using PIV(Particle Image Velocimetry). The streamline, velocity and pressure distributions in the wafer carrier are graphically depicted for various conditions.