http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
손호천,김상옥,조성진 慶星大學校 1999 論文集 Vol.20 No.2
In this paper, the characteristics of metal films such as Al and Cu deposited by thermal evaporation, IBD and ICBD techniques have been studied using XRD, AFM, SEM-EDS. The results show that the initial orientation, the smoothness of these films is improved dramatically by using ion beam methods because of the very slow deposition rate and the adequate surface arrival energy. The deposition rate of the films by IBD and ICBD technique is slower than that of the films by thermal evaporation. And the surface arrival energies of the deposited atoms are from few eV for ICBD to several hundred eV for IBD. These energies are converted to surface migration energies and shallow implantation energies which improve surface qualities.