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Hard Mask의 종류 및 높이가 Glass Microfluidic Chip 제작에 미치는 영향
박병선(Byongson Park),송시몬(Simon Song) 대한기계학회 2007 대한기계학회 춘추학술대회 Vol.2007 No.10
This paper compares the effects of a poly silicon mask and a chrome mask on the fabrication of a glass microfluidic chip. Although a poly-dimethylsiloxane (PDMS) is frequently used for a microfluidic chip due to an easy fabrication method and the replication of a chip by molding, there are many restrictions for wide applications because of the hydrophobic surface properties of PDMS. In contrast, a glass chip has a superior surface properties for a variety of biochemical analyses despite a complicated fabrication processes. Generally, a glass chip is fabricated by using wet etching process which uses buffered oxide etchant (BOE) to etch a glass substrate after making a pattern onto a glass wafer. We fabricate a glass microfluidic chip and examine the channel surface quality using different materials and height of hard masks. Poly silicon and chrome with different heights are deposited onto glass wafers. After making a microchannel pattern, we wet-etch the glass wafers, and examine channel surface quality using microscope. The results indicate that a poly-silicon hard mask leads to a smooth channel surfaces compared to a chrome mask despite a little complicated fabrication method.