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전상범(S. B. Jun),김욱형(U. H. Kim),김국원(K. W. Kim),김남웅(N. W. Kim) 한국생산제조학회 2011 한국생산제조시스템학회 학술발표대회 논문집 Vol.2011 No.4
Nanoimprint Lithography (NIL) is one fo the most versatile and promising technology for micro/nano-patternming due to its simplicity, high throughput and low cost, Recently, one of the major trends of NIL is large-area patterning. Generally it is expected that NIL achieves productivity improvement by decrease of tact time and elevation of yield rate. Technical difficulties to keep the uniformity of the residual layer, however, become severer as the imprinting area increases more and more. In this paper, a numerical study for a large area NIL to analyze the filling process and to improve the uniformity of residual layer was performed.