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습식 Cr도금 대체를 위한 CrN박막의 내마모성 및 내식성 향상에 관한 연구
김상식(Sang S.Kim),김갑석(Kab S.Kim),한전건(Jeon G.Han) 한국자동차공학회 1997 한국자동차공학회 춘 추계 학술대회 논문집 Vol.1997 No.6_2
CrN hard coating becomes one of the attractive protective films for enhancement of wear and corrosion resistance due to its superior properties. In addition, the noted property of CrN coating is the excellent corrosion resistance. Therefore CrN coating has a strong potential to replace the electro-deposited hard chrome coating which generates serious environmental pollution problem at present in the world. In this study, CrN film was deposited on S45C by cathodic arc ion plating process. The deposition of CrN laver was carried out at the various N₂ partial pressure of 5×10^-3 torr to 2×10^-2 torr under the bias voltage of -200V. All the coated specimens were analyzed by XRD and SEM for structural characterization and the wear and corrosion behaviors were compared with those of hard Cr coated specimens y ball-on-disc wear test and electrochemical polarization measurement.<br/> The CrN coating deposited at 1×10^-2 torr showed the highest CrN(220) intensity and a maximum hardness of Hk 2700 which is twice of that of the hard Cr coating. The wear resistance of CrN coated S45C against Al₂O₃ and AISI 52100 steel balls was highly improved compared to that of the hard Cr coating. The CrN coatings also enhanced the resistance of pitting and crevice corrosion. This improvement was associated with the formation of the CrN coatings with dense and fine granular structures without microcrack which exists in all the electroplated hard Cr coating.<br/>
폴리머 기판상에 합성된 저온 ITO 박막에 미치는 Ar + H₂ 플라즈마의 영향
문창성(Chang S. Moon),정윤모(Yun M. Chung),이호영(Ho Y. Lee),김용모(Yong M. Kim),김갑석(Kab S. Kim),M. Gaillard,한전건(Jeon G. Han) 한국표면공학회 2006 한국표면공학회지 Vol.39 No.5
Indium tin oxide (ITO) films were synthesized on polymer (PES, polyethersulfone) at room temperature by pulsed DC magnetron sputtering. By the control of introducing hydrogen to argon atmosphere, the resistivity of ITO films was obtained at 5.27 × 10<SUP>?4</SUP> Ω · ㎝ without substrate heating in comparison with 2.65 × 10<SUP>?3</SUP> Ω · ㎝ under hydrogen free condition. ITO film synthesized at Ar condition was changed from amorphous to crystalline. These result from the enhancement of electron temperature in Ar + H₂ plasma, which induces the increase of ionization of target materials and argon. The dominant increase of ions such as In Ⅱ and O Ⅱ and neutral Sn Ⅰ was monitored by optical emission spectroscopy (OES). Thermal energy required for the crystalline film formation is compensated by kinetic energy transfer through ion bombardments to substrate.
CFUBMS을 이용한 TiZrAlN 나노복합 박막의 미세 구조와 기계적 특성
김연준(Youn J. Kim),이호영(Ho Y. Lee),김용모(Yong M. Kim),김갑석(Kab S. Kim),한전건(Jeon G. Han) 한국표면공학회 2007 한국표면공학회지 Vol.40 No.1
Quaternary TiZrAlN nanocomposite thin films were synthesized by Closed-Field Unbalanced Magnetron Sputtering (CFUBMS), and their microstructure and mechanical characteristics were examined. The grain refinement of the TiZrAlN nanocomposite thin films was controlled by adjusting the N₂ partial pressure. The hardness of the film varied with the N₂ partial pressure and the maximum value was obtained approximately 47 ㎬. It was also confirmed that there is a critical value of the grain size (dc) to need maximum hardness.