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Mo 화학기상증착에 있어서 불순물 농도에 미치는 증착조건의 영향
배상석,서성교,홍은식,김승모,조미정,한혜정,이두성,김세훈,민석홍 국립7개대학공동논문집간행위원회 2001 공업기술연구 Vol.1 No.-
The thermal decomposition process of Mo(CO)_6 on chemical vapor deposition was investigated by analyzing the effects of deposition temperature, pressure, and reaction gas on the phase change of deposited films. Mo_2C was deposited at or below 350℃ due to the incompleteness of thermal decomposition of Mo(CO)_6, but Mo films was successfully deposited at 400℃ or higher temperatures. The variation of deposition pressure did not change the dependence of decomposition process on deposition temperature. The activation energy of surface reaction was 5.8 ㎉/mole.