In this study thesis, new polymaleimides containing chalcone unit in side chain were synthesized and characterized, and their controllability of reactive mesogen liquid crystal alignment on photoalignment surfaces were investigated. The new polymaleim...
In this study thesis, new polymaleimides containing chalcone unit in side chain were synthesized and characterized, and their controllability of reactive mesogen liquid crystal alignment on photoalignment surfaces were investigated. The new polymaleimides containing chalcone unit in side chain were prepared by esterification of Polymaleimides with hydroxyl group and three kinds of chalcone groups. The photopolymers with para, meta, and ortho position of carboxyl acid in the chalconyl group have the same to alkyl spacer length(C=6) introduced between main chain and chalconyl moiety. These photopolymers were characterized by FT-IR, 1H-NMR, UV-VIS and their properties were evaluated by solubility, thermal stability and LC alignment. Solubility of all polymers were shown similar that good soluble at general organic solvent such as THF, MEk but poor soluble in methanol, ethanol such as alcoholic solvent. The thermal stability of photopolymers was confirmed by the glass transition temperature of 79-91 ℃, decomposition temperature of 335-387 ℃, respectively. Para position of photopolymer was shown highest thermal stability. The UV absorption peak about 310-315 nm decreases abruptly in intensity in the early and then intensity decreases more slowly with increasing energy exposure by induced photodimerization. The pretilt angle generated was about 0.06-3.00o by polarized UV irradiation. These photopolymers were revealed not only high sensitivity but also superior alignment properties to the 50 mJ/cm2 of LPUV exposure energy. The alignment of photopolymers strongly depended on the substituted position of chalcone derivatives and that increase in the order PM6-m-ChF ≥ PM6-p-ChF ≫ PM6-o-ChF. Nonalignment ratio rapidly decreased at 40 mJ/cm2. Whereas PM6-o-ChF was measured over 42 % nonalignment ratio at all point. These results suggested that the higher sensitivity and alignment properties of PM6-m-ChF and PM6-p-ChF resulted from efficient molecular position of chalcone units in the photopolymers by to the irradiated direction of LPUV light used in this work. Through commercial applicability for patterned retardation film, it is confirmed that PM6-m-ChF shows an actual POM image of an excellent multi-domain alignment film that has been superior aligned by a aligned layer. It also was identified that PM6-m-ChF exhibited the enough possibility of commercial application for patterned retardation film through the multi-domain alignment properties and evaluation of non-alignment ratio. Despite that photoalignment film for practical application requires high alignment sensitivity under the 20 mJ/cm2 in order to apply the practical process, all photopolymers must be considerably the attractive materials for applicable to new display, including a patterned retarder film for 3D displays, because the high thermal stability and control of various process variable can be easily enhanced the photoalignment.