Investigation of Spray CVD Process of InSnOx and SbSnOx thin films

다국어 초록 (Multilingual Abstract)

Because of spray pyrolysis method with its simple equipment, low cost and fast sample preparation that it become a useful and potential application to make transparent oxide semiconductor thin films. In addition, spray pyrolysis method used in industrial production of coated glass has a broad application fields.
Through the study of a thorough literature review and on the basis of preliminary studies, I proposed to use inorganic metal salt SnCl2·2H2O and SbCl3, InCl3·xH2O and SnCl4·5H2O as raw materials to obtain SbSnOx films and InSnOx films with excellent optical and electrical properties by spray pyrolysis. And in-depth explored the formation mechanism of thin films made by spray pyrolysis.

목차 (Table of Contents)

• Contents ⅱ
• List of tables ⅲ
• List of figures ⅳ
• ABSTRACT ⅵ
• Ⅰ. Introduction 1
• Ⅱ. Literature survey 3
• 2.1 Characteristic of tin oxide 3
• 2.2 The methods for manufacturing transparent conductive thin films 4
• 2.3 Spray pyrolysis 5
• 2.4 Transparent Conducting Oxide (ITO and ATO films) 8
• Ⅲ. Spray CVD of SnO2 Oxide semiconductor thin film 10
• 3.1 Experimental method 10
• 3.2 Results and Discussions 14
• Ⅳ. UV irradiation test for the films 39
• V. Conclutions 48
• Reference 49