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Square arrays of holes and dots patterned from a linear ABC triblock terpolymer.
Choi, Hong Kyoon,Gwyther, Jessica,Manners, Ian,Ross, Caroline A American Chemical Society 2012 ACS NANO Vol.6 No.9
<P>Microphase separation of a polyisoprene-b-polystyrene-b-polyferrocenylsilane (PI-b-PS-b-PFS) triblock terpolymer film during chloroform solvent-annealing formed a 44 nm period square-symmetry array of alternating PI and PFS cylinders in a PS matrix. This nanostructure was converted to either a positive pattern of posts or a negative pattern of holes with tunable diameter by oxygen reactive ion etching or by surface reconstruction in a solvent, respectively, and coexisting post and hole patterns were also formed. Square arrays of silicon posts, pits, and inverted pyramids were fabricated by pattern transfer from the triblock terpolymer film into silicon substrates. The morphology of the triblock terpolymer film varied with the chloroform vapor pressure during solvent annealing, which was explained by selective swelling of the PI block at high vapor pressures. This triblock terpolymer system provides a convenient block copolymer lithography process for generation of nanoscale posts or holes with square symmetry.</P>
Self-assembly of dendron-helical polypeptide copolymers: organogels and lyotropic liquid crystals
Kim, Kyoung Taek,Park, Chiyoung,Kim, Chulhee,Winnik, Mitchell A.,Manners, Ian Royal Society of Chemistry 2006 Chemical communications Vol.2006 No.13
<P>New macromolecular self-assembling building blocks, dendron-helical polypeptide copolymers, have been synthesized; these materials possess a well-defined 3-D shape and self-assemble in solution to form nanoribbon and lyotropic liquid crystalline phases.</P> <P>Graphic Abstract</P><P>New macromolecular self-assembling building blocks, dendron-helical polypeptide copolymers, have been synthesized. These materials possess a well-defined 3-D shape and self-assemble in solution to form nanoribbon and lyotropic liquid crystalline phases. <IMG SRC='http://pubs.rsc.org/services/images/RSCpubs.ePlatform.Service.FreeContent.ImageService.svc/ImageService/image/GA?id=b516625j'> </P>
Large-Area Nanosquare Arrays from Shear-Aligned Block Copolymer Thin Films
Kim, So Youn,Nunns, Adam,Gwyther, Jessica,Davis, Raleigh L.,Manners, Ian,Chaikin, Paul M.,Register, Richard A. American Chemical Society 2014 NANO LETTERS Vol.14 No.10
<P>While block copolymer lithography has been broadly applied as a bottom-up patterning technique, only a few nanopattern symmetries, such as hexagonally packed dots or parallel stripes, can be produced by spontaneous self-assembly of simple diblock copolymers; even a simple square packing has heretofore required more intricate macromolecular architectures or nanoscale substrate prepatterning. In this study, we demonstrate that square, rectangular, and rhombic arrays can be created via shear-alignment of distinct layers of cylinder-forming block copolymers, coupled with cross-linking of the layers using ultraviolet light. Furthermore, these block copolymer arrays can in turn be used as templates to fabricate dense, substrate-supported arrays of nanostructures comprising a wide variety of elements: deep (>50 nm) nanowells, nanoposts, and thin metal nanodots (3 nm thick, 35 nm pitch) are all demonstrated.</P><P><B>Graphic Abstract</B> <IMG SRC='http://pubs.acs.org/appl/literatum/publisher/achs/journals/content/nalefd/2014/nalefd.2014.14.issue-10/nl502416b/production/images/medium/nl-2014-02416b_0007.gif'></P><P><A href='http://pubs.acs.org/doi/suppl/10.1021/nl502416b'>ACS Electronic Supporting Info</A></P>