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SnO<SUB>2</SUB> 박막증착을 위한 APCVD Reactor 내 유량 균일도 향상에 대한 수치 해석적 연구
박준우(J.W. Park),윤익로(I.R. Yoon),정하승(H.S. Chung),신승원(S.W. Shin),박승호(S.H. Park),김형준(H.J. Kim) 한국전산유체공학회 2010 한국전산유체공학회 학술대회논문집 Vol.2010 No.5
With continuously increasing flat panel display size, uniformity of thin film deposition has been drawing more attentions and associated fabrication methodologies are being actively investigated. Since the convective flow field of mixture gas plays a significant role for deposition characteristics of thin film in an APCVD system, it is greatly important to maintain uniform distribution and consistent concentration of mixture gas species. In this paper, computational study has been performed for the improvement of flow uniformity of mixture gas in an APCVD reactor during thin film deposition process. A diffuser slit has bee designed to spread the locally concentrated gas flow exiting from the flow distributor. A uniform flow distributor has been developed which has less dependency on operating conditions for global flow uniformity