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오용철 ( Y. C. Oh ),김진사 ( J. S. Kim ),조춘남 ( C. N. Cho ),신철기 ( C. G. Shin ),송민종 ( M. J. Song ),최운식 ( W. S. Choi ),소병문 ( B. M. So ),김충혁 ( C. H. Kim ) 한국전기전자재료학회 2005 한국전기전자재료학회 하계학술대회 논문집 Vol.2005 No.0
The (Sr(1-x)Ca(x))TiO₃(SCT) thin films are deposited on Pt-coated electrode (Pt/TiN/SiO₂/Si) using RF sputtering method with substitutional contents of Ca. The optimum conditions of RF power and Ar/O₂ ratio were 140[W] and 80/20, respectively. Deposition rate of SCT thin film was about 18.75[Å/min]. The dielectric constant was increased with increasing the substitutional contents of Ca, while it was decreased if the substitutional contents of Ca exceeded over 15[mol%]. All SCT thin films used in this study show the phenomena of dielectric relaxation with the increase of frequency, and the relaxation frequency is observed above 200[kHz].