http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
- 中文 을 입력하시려면 zhongwen을 입력하시고 space를누르시면됩니다.
- 北京 을 입력하시려면 beijing을 입력하시고 space를 누르시면 됩니다.
RISS 인기검색어
- 검색키워드
- 저자 : 김준휘(Kim Joonhui) (검색결과 1 건)
- 무료
- 기관 내 무료
- 유료
-
원자현미경을 이용한 나노구조체의 각도측정 방법 및 조건
조상준(Cho Sang-Joon),안병운(Ahn Byung-Woon),김준휘(Kim Joonhui),정상한(Chung Sang Han) 표준인증안전학회 2012 표준인증안전학회지 Vol.2 No.1
Invention of the atomic force microscopy (AFM) has provided a powerful measurement capability for sub-nano scale science and technology. Since invention, AFM has been significantly improved, and numerous innovative mechanisms and measuring modes have been developed. As the progress of miniaturization in patterns and photoresist structures in semiconductor, microelectronics, and glass industry, along with the fast advance of the extremely versatile nanotechnology applications, in a great number of industrial processes calls for reliable and comparable quantitative dimensional measurements in the micro- and submicrometer range. To make matters worse, there has been an increasing demand for measuring characteristics of sidewalls like line edge and line width roughness, wave pattern of sidewalls and angles of overhang features. Realizing that currently available CD-AFM or CD-SEM techniques do not satisfy this demand, new measurement standards are required for angles of micro- and nano-structures. In spite of the many capabilities of AFM, quite a few conditions have to be considered to measure critical dimensions (CD) quantitatively with repeatability and reproducibility. Piezo hysteresis, drift, tip shape and consistency, scanner orthogonality and other things are included in the conditions. The requirements and process to measure critical angle of nano- and micro-structure using AFM will be described in this paper.
연관 검색어 추천
이 검색어로 많이 본 자료
활용도 높은 자료
