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박막의 두께에 따른 잔류 응력이 나노 패턴의 무너짐에 미치는 영향에 대한 연구
김범래(Beom Rae Kim),문성남(Sung Nam Moon),정재민(Jae Min Jung),최성학(Sung Hak Choi),이우일(Woo Il Lee) 대한기계학회 2013 대한기계학회 춘추학술대회 Vol.2013 No.12
After Nano Imprint Lithography (NIL) process, the collapse of imprinted nano patterns which are major problem for pattern fidelity is commonly found. We assumed that insufficient relaxation time and the initial stress of polymer resist on which the pattern is imprinted have a relation with that collapse phenomenon. In this study, therefore, we measured the stress of polymer nano films for the different film thickness by varying spin-coating speed. The results show that the stress of PMMA film was found to decrease with increasing film thickness and the patterns was rapidly collapsed when the stress-thickness ratio increased.
열 나노임프린트 리소그래피 공정에서의 분자량에 따른 고분자 미세 변형 특성에 대한 연구
문성남(Sung Nam Moon),정재민(Jae Min Jung),김범래(Beom Rae Kim),이다솜(Da Som Lee),이우일(Woo Il Lee) 대한기계학회 2013 대한기계학회 춘추학술대회 Vol.2013 No.12
This study investigated the effect of polymer molecular size which varies with the molecular weight on the deformation of thermoplastic polymer. Polystyrene of different molecular weights with varying orders of magnitude were deposited on the substrate, and then the thermal nanoimprint lithography experiments were carried out using stamps of various pattern sizes in order to observe the polymer deformation. The results show that the radius of gyration should be smaller than the size of the cavity for fine pattern transfer, and the degree of filling decreases as the relative size of the radius of gyration to the cavity width increases, indicating that the molecular weight of the polymer chains is important variable in nano-scale deformation. Results also show that the polymers have similar value of the radius of gyration with the previous solvent status even after the solvent was evaporated through spin-coating process.