Characteristics of Environmental Solar Ultraviolet Irradiance

Sasaki, Masako,Oyanagi, Takehiko,Takeshita, Shu Korean Society of Photoscience 2002 Journal of Photosciences Vol.9 No.2

Direct, continuous, and accurate measurements of solar ultraviolet irradiance (290-400 nm: UVR) have been carried out since 1990, by using both band-spectral ultraviolet-B (290-320 nm: UV-B) and ultraviolet-A (320-400 nm: UV-A) radiometers at Tokai University in Hiratsuka, Japan (35$^{\circ}$N, 139$^{\circ}$E). From our observations, the following findings are provided: 1) an increasing trend in solar UV -B from Oct. 1990 to Sept. 2000; 2) a regional comparison of solar UVR in Japan; 3) the distinct characteristics of UV-B and UV-A irradiance, such as diffuse property, daily and seasonal variation; and 4) human body protection against solar UVR. An increasing 10-year trend in global solar UV - B in Hiratsuka corresponded to a decrease in the total ozone amount measured at Tsukuba (36$^{\circ}$N, 140$^{\circ}$E), giving supportive evidence for a direct link between these two parameters. Furthermore, a strong correlation was found between solar UV-B and total ozone amount from results of UVR measurements at four Tokai University monitoring stations dispersed throughout Japan. Additional results revealed different diffuse properties in global solar UV and in global solar total (300-3000 nm: Total) irradiances. For example, in the global UVR, the diffuse component was dominant: about 80 % independent of weather, with more than 60 % of global UV-B, and more than 50% of global UV-A with even a cloudless clear sky. On the other hand, the portion of the diffuse in the global total irradiance was very low, less than 10 % on a cloudless clear day. Daily and seasonal variations of UV -B and UV -A irradiances were found to be quite different, because of the marked dependence of UV -B irradiance on the atmospheric ozone amount. Moreover, UV -B irradiance showed large daily and seasonal variations: the ratio between maximum and minimum irradiances was more than 5. In contrast, the variation in UV-A was small: the ratio between maximum and minimum was less than 2. Three important facts are proposed concerning solar UVR protection of the human body: 1) the personal minimal erythema dose (MED); 2) gender based difference in MED values; and 3) proper colors for UVR protective clothing.

서울의 최근 자외선 복사의 변화 2004~2010

김준(Jhoon Kim),박상서(Sang Seo Park),조나영(Nayeong Cho),김우경(Woogyung Kim),조희구(Hi Ku Cho) 한국기상학회 2011 대기 Vol.21 No.4

The climatology of surface UV radiation for Seoul, presented in Cho et al. (1998; 2001), has been updated using measurement of surface erythemal ultraviolet (EUV) and total ultraviolet (TUV) irradiance (wavelength 286.5~363.0 ㎚) by a Brewer Spectrophotometer (MK-IV) for the period 2004~2010. The analysis was also carried out together with the broadband total (global) solar irradiance (TR ; 305~2800 nm) and cloud amount to compare with the UV variations, measured by Seoul meteorological station of Korean Meteorological Agency located near the present study site. Under all-sky conditions, the day-to-day variability of EUV exhibits annual mean of 98% in increase and 31% in decrease. It has been also shown that the EUV variability is 17 times as high as the total ozone in positive change, whereas this is 6 times higher in negative change. Thus, the day to day variability is dominantly caused rather by the daily synoptic situations than by the ozone variability. Annual mean value of daily EUV and TUV shows 1.62 kJm?² and 0.63 MJm?² respectively, whereas mean value of TR is 12.4 MJm?² (143.1Wm?²). The yearly maximum in noon-time UV Index (UVI) varies between 9 and 11 depending on time of year. The highest UVI shows 11 on 20 July, 2008 during the period 2004~2010, but for the period 1994~2000, the index of 12 was recorded on 13 July, 1994 (Cho et al., 2001). A 40% of daily maximum UVI belongs to “low (UVI < 2)”, whereas the UVI less than 5% of the maximum show “very high (8 < UVI < 10)”. On average, the maximum UVI exceeded 8 on 9 days per year. The values of Tropospheric Emission Monitoring Internet Service (TEMIS) EUV and UVI under cloud-free conditions are 1.8 times and 1.5 times, respectively, higher than the all-sky measurements by the Brewer. The trend analysis in fractional deviation of monthly UV from the reference value shows a decrease of -0.83% and -0.90% decade?¹ in the EUV and TUV, respectively, whereas the TR trend is near zero (+0.11% decade?¹). The trend is statistically significant except for TR trend (p = 0.279). It is possible that the recent UV decrease is mainly associated with increase in total ozone, but the trend in TR can be attributed to the other parameters such as clouds except the ozone. Certainly, the cloud effects suggest that the reason for the differences between UV and TR trends can be explained. In order to estimate cloud effects, the EUV, TUV and TR irradiances have been also evaluated for clear skies (cloud cover < 25%) and cloudy skies (cloud cover ≥ 75%). Annual mean values show that EUV, TUV and TR are 2.15 kJm?², 0.83 MJm?², and 17.9MJm?² for clear skies, and 1.24 kJm?², 0.46 MJm?², and 7.2 MJm?² for cloudy skies, respectively. As results, the transmission of radiation through clouds under cloudy-sky conditions is observed to be 58%, 55% and 40% for EUV, TUV and TR, respectively. Consequently, it is clear that the cloud effects on EUV and TUV are 18% and 15%, respectively lower than the effects on TR under cloudy-sky conditions. Clouds under all-sky conditions (average of cloud cover is 5 tenths) reduced the EUV and TUV to about 25% of the clear-sky (cloud cover < 25%) values, whereas for TR, this was 31%. As a result, it is noted that the UV radiation is attenuated less than TR by clouds under all weather conditions.

자외선 광을 활용하는 화학기계적 연마에 관한 연구 동향

이현섭 한국트라이볼로지학회 2022 한국트라이볼로지학회지 (Tribol. Lubr.) Vol.38 No.6

Chemical mechanical polishing (CMP) is a hybrid surface-polishing process that utilizes both mechanical and chemical energy. However, the recently emerging semiconductor substrate and thin film materials are challenging to process using the existing CMP. Therefore, previous researchers have conducted studies to increase the material removal rate (MRR) of CMP. Most materials studied to improve MRR have high hardness and chemical stability. Methods for enhancing the material removal efficiency of CMP include additional provision of electric, thermal, light, mechanical, and chemical energies. This study aims to introduce research trends on CMP using ultraviolet (UV) light to these methods to improve the material removal efficiency of CMP. This method, photocatalysis-assisted chemical mechanical polishing (PCMP), utilizes photocatalytic oxidation using UV light. In this study, the target materials of the PCMP application include SiC, GaN, GaAs, and Ru. This study explains the photocatalytic reaction, which is the basic principle of PCMP, and reviews studies on PCMP according to materials. Additionally, the researchers classified the PCMP system used in existing studies and presented the course for further investigation of PCMP. This study aims to aid in understanding PCMP and set the direction of future research. Lastly, since there have not been many studies on the tribology characteristics in PCMP, research on this is expected to be required.