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Human Interface Technologies in Consideration of Universal Design
Noriyuki Kawarazaki,Tadashi Yoshidome,Takayuki Tanaka 제어로봇시스템학회 2009 제어로봇시스템학회 국제학술대회 논문집 Vol.2009 No.8
According to the aged society, the universal design is very important concept for creating the products. The Universal Design Technical Committee in SICE System Integration Division started from Nov. 2000. We introduce the activity of the universal design technical committee. The research about the universal design technologies are concerned with the interface technologies, welfare engineering and the usability evaluation. It is very important concept for creating the useful interface to consider the universal design. This paper describes the several researches about the universal design technologies. For example, visual and haptic display and wearable goods-informing system are developed.
Mustard, Thomas Jeffrey Lomax,Kwak, Hyunwook Shaun,Goldberg, Alexander,Gavartin, Jacob,Morisato, Tsuguo,Yoshidome, Daisuke,Halls, Mathew David The Korean Ceramic Society 2016 한국세라믹학회지 Vol.53 No.3
Continued miniaturization and increasingly exact requirements for thin film deposition in the semiconductor industry is driving the search for new effective, efficient, selective precursors and processes. The requirements of defect-free, conformal films, and precise thickness control have focused attention on atomic layer deposition (ALD). ALD precursors so far have been developed through a trial-and-error experimental approach, leveraging the expertise and tribal knowledge of individual research groups. Precursors can show significant variation in performance, depending on specific choice of co-reactant, deposition stage, and processing conditions. The chemical design space for reactive thin film precursors is enormous and there is urgent need for the development of computational approaches to help identify new ligand-metal architectures and functional co-reactants that deliver the required surface activity for next-generation thin-film deposition processes. In this paper we discuss quantum mechanical simulation (e.g. density functional theory, DFT) applied to ALD precursor reactivity and state-of-the-art automated screening approaches to assist experimental efforts leading toward optimized precursors for next-generation ALD processes.