http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
Pulsed Magnetron Sputtering Deposit ion of DLC Films Part I : Low-Voltage Bias-Assisted Deposition
Oskomov, Konstantin V.,Chun, Hui-Gon,You, Yong-Zoo,Lee, Jing-Hyuk,Kim, Kwang-Bok,Cho, Tong-Yul,Sochogov, Nikolay S.,Zakharov, Alexender N. The Korean Institute of Surface Engineering 2003 한국표면공학회지 Vol.36 No.1
Pulsed magnetron sputtering of graphite target was employed for deposition of diamond-like carbon (DLC) films. Time-resolved probe measurements of magnetron discharge plasma have been performed. It was shown that the pulsed magnetron discharge plasma density ($∼10^{17}$ $m^{-3}$ ) is close to that of vacuum arc cathode sputtering of graphite. Raman spectroscopy was sed to examine DLC films produced at low ( $U_{sub}$ / < 1 kV) pulsed bias voltages applied to the substrate. It has been shown that maximum content of diamond-like carbon in the coating (50-60%) is achieved at energy per deposited carbon atom of $E_{c}$ =100 eV. In spite of rather high percentage of $sp^3$-bonded carbon atoms and good scratch-resistance, the films showed poor adhesion because of absence of ion mixing between the film and the substrates. Electric breakdowns occurring during the deposition of the insulating DLC film also thought to decrease its adhesion.
Pulsed Magnetron Sputtering Deposition of DLC Films Part Ⅰ
Konstantin V. Oskomov,Hui-Gon Chun,Yong-Zoo You,Jing-Hyuk Lee,Kwang-Bok Kim,Tong-Yul Cho,Nikolay S. Sochogov,Alexender N. Zakharov 한국표면공학회 2002 한국표면공학회지 Vol.36 No.1
Pulsed magnetron sputtering of graphite target was employed for deposition of diamond-like carbon (DLC) films. Time-resolved probe measurements of magnetron discharge plasma have been performed. It was shown that the pulsed magnetron discharge plasma density (~10¹?m?³) is close to that of vacuum arc cathode sputtering of graphite. Raman spectroscopy was used to examine DLC films produced at low (Usub<1 ㎸) pulsed bias voltages applied to the substrate. It has been shown that maximum content of diamond-like carbon in the coating (50-60%) is achieved at energy per deposited carbon atom of Ec = 100 eV. In spite of rather high percentage of sp3-bonded carbon atoms and good scratch-resistance, the films showed poor adhesion because of absence of ion mixing between the film and the substrates. Electric breakdowns occurring during the deposition of the insulating DLC film. also thought to decrease its adhesion.