http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
M. Ismail,A.M. Rana,S.-U. Nisa,F. Hussain,M. Imran,K. Mahmood,I. Talib,E. Ahmed,D.H. Bao 한국물리학회 2017 Current Applied Physics Vol.17 No.10
Bilayer CeO2/TiO2 films with high-k dielectric property were prepared by rf magnetron sputtering technique at room temperature. Effect of annealing treatment on resistive switching (RS) properties of bilayer CeO2/TiO2 films in O2 ambient at different temperature in the range of 350e550 C was investigated. Our results revealed that the bilayer films had good interfacial property at 500 C and this annealing temperature is optimum for different RS characteristics. Results showed that bilayer CeO2/TiO2 film perform better uniformity and reliability in resistive switching at intermediate temperature (i.e. 450 C and 500 C) instead of low and high annealing temperature (i.e. 350 C and 550 C) at which it exhibits poor crystalline structure with more amorphous background. Less Gibbs free energy of TiO2 as compared to CeO2 results in an easier re-oxidation of the filament through the oxygen exchange with TaN electrode. However, the excellent endurance property (>2500 cycles), data retentions (105 s) and good cycle-to-cycle uniformity is observed only in 500 C annealed devices. The plots of cumulative probability, essential memory parameter, show a good distribution of Set/Reset voltage.