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R.B. Tokas,N.K. Sahoo,S. Thakur,N.M. Kamble 한국물리학회 2008 Current Applied Physics Vol.8 No.5
A comparative morphology, grain structure and optical properties studies of reactive electron beam co-evaporated mixed thin films of hafnia–silica (HfO₂:SiO₂) and zirconia–silica (ZrO₂:SiO₂) systems have been carried out using atomic force microscopy and phase modulated ellipsometry. The addition of silica, especially with small fractions, has demonstrated altogether different types of evolutions in the microstructure and morphology in these binary thin film systems possibly forming new solid solution phases. Such morphological evolutions are probed through RMS roughness, power spectral density, height–height correlation and autocorrelation analyses of the topographic data acquired through atomic force microscopy. The present investigations indicated that with composition-control morphological quality improvement is more favourable in composite hafnia–silica over the zirconia–silica films. So for ultraviolet optical coating applications which demand low light scattering thin film microstructure, hafnia–silica binary composite system has a definite edge over the zirconia–silica counterpart. A comparative morphology, grain structure and optical properties studies of reactive electron beam co-evaporated mixed thin films of hafnia–silica (HfO₂:SiO₂) and zirconia–silica (ZrO₂:SiO₂) systems have been carried out using atomic force microscopy and phase modulated ellipsometry. The addition of silica, especially with small fractions, has demonstrated altogether different types of evolutions in the microstructure and morphology in these binary thin film systems possibly forming new solid solution phases. Such morphological evolutions are probed through RMS roughness, power spectral density, height–height correlation and autocorrelation analyses of the topographic data acquired through atomic force microscopy. The present investigations indicated that with composition-control morphological quality improvement is more favourable in composite hafnia–silica over the zirconia–silica films. So for ultraviolet optical coating applications which demand low light scattering thin film microstructure, hafnia–silica binary composite system has a definite edge over the zirconia–silica counterpart.
Substrate bias effects during diamond like carbon film deposition by microwave ECR plasma CVD
R.M. Dey,S.B. Singh,A. Biswas,R.B. Tokas,N. Chand,S. Venkateshwaran,D. Bhattacharya,N.K. Sahoo,S.W. Gosavi,S.K. Kulkarni,D.S. Patil 한국물리학회 2008 Current Applied Physics Vol.8 No.1
Diamond like carbon (DLC) coatings were deposited on silicon(11) substrates by microwave electron cyclotron resonance (ECR)plasma CVD process using a plasma of Ar and CH4 gases under the inuence of DC self bias generated on the substrates by applicationof RF (13.56 MHz) power. DLC coatings were deposited under the varying inuence of DC bias (. 60 V to. 150 V) on the Si substrates.atomic force microscopy (AFM), Hardness and elastic modulus determination technique, Raman spectroscopy, scanning electronmicroscopy (SEM) and contact angle measurement. The results indicate that the lm grown at. 100 V bias has optimised propertieslike high sp3/sp2 ratio of carbon bonding, high refractive index (2.262.17) over wide spectral range 4001200 nm, low roughness of0.8 nm, high contact angle (80.) compared to the lms deposited at other bias voltages (. 60 V and . with each other and nd august explanation under the subplantation model for DLC growth.