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- 저자 : Qiwei Shu (검색결과 2 건)
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Investigation of a Plasma-Etching Process That Uses a Porous Dielectric Template
Xiaoxia Zhong,Luqi Yuan,Xiaochen Wu,Qiwei Shu,Yuxing Xia 한국물리학회 2008 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.53 No.4
A plasma etching proces of GaN films that used a porous dielectric template was investigated by using numerical simulations. The electrical field, caused by both the substrate bias and the charges acumulated on the insulating template surface, was asumed to affect ions trajectories. Reactive ions enter the sheath with a velocity calculated by using a maxwelian distribution. We found that the microscopic electrical field over the template could change the ion movement. The substrate potential and the nanopore structure showed an ability to affect the etching rate. A peak value of the reactive etching species could be found on the lateral wal in the nanopores. Changing the parameters helped to weaken the peak and, hence, to make the etching proces more effective. The work reported here may help people to understand plasma etching using a porous alumina template.
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Wie Zhou,Xiaoxia Zhong,Luqi Yaun,Qiwei Shu,Xiaochen Wu,Yuxing Xia 한국물리학회 2006 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.49 No.5I
Titanium-oxide (TiO2) thin films were deposited on unheated (111)-Si substrates by reactive dc magnetron sputtering with a substrate bias voltage of .100 V. A pure metallic titanium target was sputtered in a mixture of argon and oxygen. The structure and the optical properties of the deposited films were studied by changing the value of the total sputtering pressure. X-ray diffraction patterns show the following features: (a) only one wide rutile (110) diffraction peak was observed at a total sputtering pressure of 0.3 Pa; (b) no diffraction peak was observed at 1.2 Pa, implying an amorphous phase; (c) a TiO2 film with a pure anatase phase was obtained at 3.6 Pa, and the dominant diffraction was from the anatase (101) planes. The surface morphology was characterized with atomic force microscopy, and the roughness of the surface was found to increase with the crystal size derived from the XRD data. The optical constants were determined by using spectroscopic ellipsometry. The film deposited at 0.3 Pa, a rutile phase, possessed both a high refractive index and a low extinction coefficient. The value of the optical bandgap for the deposited on films in this experiment was much higher than the reported experimental and theoretical values.D
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