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RISS 인기검색어
- 검색키워드
- 저자 : O. Akhavan (검색결과 2 건)
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Mechano-chemical AFM nanolithography of metallic thin films: A statistical analysis
O. Akhavan,M. Abdolahad 한국물리학회 2010 Current Applied Physics Vol.10 No.4
A mechano-chemical atomic force microscope (AFM) nanolithography on a metallic thin film (50 nm in thickness) covered by a spin-coated soft polymeric mask layer (50–60 nm in thickness) has been introduced. The surface stochastic properties of initial grooves mechanically patterned on the mask layer (grooves before chemical wet-etching) and the lithographed patterns on the metallic thin film (the grooves after chemical wet-etching) have been investigated and compared by using the structure factor,power spectral density, and AFM tip deconvolution analyses. The effective shape of cross section of the before and after etching grooves have been determined by using the tip deconvolution surface analysis. The wet-etching process improved the shape of the grooves and also smoothed the surface within them. We have indicated that relaxation of the surface tension of the deposited mask layer after the AFM scribing is independent from surface density of the grooves and also their length scale. Based on the statistical analysis, it was found that increase of the width of the grooves after the wet-etching and also relaxation of surface tension of the mask layer resulted in a down limit in the size of the metallic nanowires made by the combined nanolithography method. An extrapolation of the analyzed statistical data has indicated that, in this method, the minimum obtainable width and length of the metallic nanowires are about 55 nm and 2 ㎛, respectively.
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O. Akhavan,E. Ghaderi 한국물리학회 2009 Current Applied Physics Vol.9 No.6
Bactericidal activity of high concentration Ag nanoparticles immobilized on surface of an aqueous sol–gel silica thin film was investigated against Escherichia coli and Staphylococcus aureus bacteria. Size of the surface nanoparticles was estimated in the range of 35–80 nm by using atomic force microscopy. Due to accumulation of the silver nanoparticles at near the surface (at depth of 6 nm and about 40 times greater than the silver concentration in the sol), the synthesized Ag–SiO2 thin film (with area of 10 ㎟) presented strong antibacterial activities against E. coli and S. aureus bacteria with relative rate of reduction of the viable bacteria of 1.05 and 0.73 h-1 for initial concentration of about 105 cfu/ml, respectively. In addition, the dominant mechanism of silver release in long times was determined based on water diffusion in surface pores of the silica film, unlike the usual diffusion of water on the surface of silver-based bulk materials. Therefore, the Ag nanoparticles embedded near the surface of the SiO2 thin film can be utilized in various antibacterial applications with a strong and long life activity. Bactericidal activity of high concentration Ag nanoparticles immobilized on surface of an aqueous sol–gel silica thin film was investigated against Escherichia coli and Staphylococcus aureus bacteria. Size of the surface nanoparticles was estimated in the range of 35–80 nm by using atomic force microscopy. Due to accumulation of the silver nanoparticles at near the surface (at depth of 6 nm and about 40 times greater than the silver concentration in the sol), the synthesized Ag–SiO2 thin film (with area of 10 ㎟) presented strong antibacterial activities against E. coli and S. aureus bacteria with relative rate of reduction of the viable bacteria of 1.05 and 0.73 h-1 for initial concentration of about 105 cfu/ml, respectively. In addition, the dominant mechanism of silver release in long times was determined based on water diffusion in surface pores of the silica film, unlike the usual diffusion of water on the surface of silver-based bulk materials. Therefore, the Ag nanoparticles embedded near the surface of the SiO2 thin film can be utilized in various antibacterial applications with a strong and long life activity.
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