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Wavelength Dependence of Photochemical Surface Modication of Silicone Rubber
Masayuki Okoshi,Minako Iyono,Narumi Inoue,Tsugito Yamashita 한국물리학회 2009 THE JOURNAL OF THE KOREAN PHYSICAL SOCIETY Vol.54 No.3
Photochemical surface modifications of silicone ([SiO(CH3)2]n) rubber have been successfully demonstrated by using various UV pulsed lasers; a 157-nm F2 laser and a 193-nm ArF and by using the 266-nm fourth harmonic of a Nd:YAG laser. The F2 laser modified silicone into transparent silica (SiO2). By switching the light source from a F2 laser to an ArF excimer laser or to the fourth harmonic of a Nd:YAG laser, we could modify the surface of the silicone rubber into a photoluminescent material or into amorphous carbon, respectively. Based on the photochemical modifications, micron-sized silica optical waveguides and white light sources could be integrated into a silicone rubber chip. Photochemical surface modifications of silicone ([SiO(CH3)2]n) rubber have been successfully demonstrated by using various UV pulsed lasers; a 157-nm F2 laser and a 193-nm ArF and by using the 266-nm fourth harmonic of a Nd:YAG laser. The F2 laser modified silicone into transparent silica (SiO2). By switching the light source from a F2 laser to an ArF excimer laser or to the fourth harmonic of a Nd:YAG laser, we could modify the surface of the silicone rubber into a photoluminescent material or into amorphous carbon, respectively. Based on the photochemical modifications, micron-sized silica optical waveguides and white light sources could be integrated into a silicone rubber chip.