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        Recent Progress of Gr/Si Schottky Photodetectors

        Qingguo Shao,Hao Qi,Chao Li,Kunpeng Cai,Jianxia Dong,Xuhui Liu,Ning Cao,Xiaobei Zang 대한금속·재료학회 2023 ELECTRONIC MATERIALS LETTERS Vol.19 No.2

        By combing the carrier mobility of graphene with the excellent light absorption properties of silicon, ultra-shallow Schottkyjunction can be obtained, and can exist stably for a long time. The photoelectric property of Schottky junction is determinednot only by graphene and silicon semiconductor layer, but also by the interface layer between the two. Through a series ofoptimizations, the performance of graphene/silicon Schottky junction photodetectors can be continuously improved. Asa result, graphene/silicon Schottky junctions more promising for the development of next generation photodetectors withits stability, ease of preparation and sensitivity. In this review, we firstly give a brief introduction to Gr Schottky junctionphotodetectors, and then present a comprehensive review on the recent progress of optimizing Gr/Si Schottky junction photodetectorsin the past few years, including light management engineering, band engineering and interfacial engineering. Finally, the current challenges are summarized and further perspectives are outlined.

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