http://chineseinput.net/에서 pinyin(병음)방식으로 중국어를 변환할 수 있습니다.
변환된 중국어를 복사하여 사용하시면 됩니다.
- 中文 을 입력하시려면 zhongwen을 입력하시고 space를누르시면됩니다.
- 北京 을 입력하시려면 beijing을 입력하시고 space를 누르시면 됩니다.
RISS 인기검색어
- 검색키워드
- 저자 : Jean-Philippe Sarrette (검색결과 4 건)
- 무료
- 기관 내 무료
- 유료
-
Andre Ricard,Jean-Philippe Sarrette,전병욱,김유권 한국물리학회 2017 Current Applied Physics Vol.17 No.7
With a potential application to surface modification of oxide materials in mind, active species in RF and microwave (UHF) N2 afterglows were analyzed in our newly designed flowing reactors. For both plasma systems, discharge of N2 was generated in a long quartz tube with a small diameter (dia. 5e6 mm) and then was directly injected into a chamber with a large diameter of 15e20 cm. The discharge condition was set to be similar between the two systems; the gas pressure, flow rate and the applied power were 6 Torr, 0.6 slm and 100W, respectively. Under this condition, the residence time at the chamber inlet was (1e3) x 10『3 s. The RF and UHF afterglows were formed in the chamber with luminous jets from the end of the discharge tube. However, we found that the densities of active species were quite sourcedependent; N and N2(A) densities were higher in UHF than in RF in spite of more O-atoms impurity. The origin of such difference is also attributed to the inherent difference in the nature of excitation between the two plasma sources; RF is more vibrational and is longer than UHF.
-
Wang, Yunfei,Ricard, Andre,Sarrette, Jean-Philippe,Kim, Ansoon,Kim, Yu Kwon Elsevier Sequoia 2017 Surface & coatings technology Vol.324 No.-
<P><B>Abstract</B></P> <P>We find that surface modification characteristics of TiO<SUB>2</SUB> using N<SUB>2</SUB> RF plasma are strongly dependent on the detailed composition of active species in the plasma and the afterglows. The surface nitriding of ALD-grown TiO<SUB>2</SUB> films in pure N<SUB>2</SUB> RF afterglows at room temperature (RT) is found to be more effective in the late afterglows than in the early afterglows. Adding a small fraction of H<SUB>2</SUB> in N<SUB>2</SUB> results in suppression of surface nitriding, suggesting that the change in the composition of the active species in the afterglows by H<SUB>2</SUB> is the origin to the suppressed nitriding performance. Here, we present our analysis on the surface chemical composition after the plasma modification as well as the densities of excited species such as N atoms, N<SUB>2</SUB>(A) and N<SUB>2</SUB>(X, <I>v</I>) metastable molecules and N<SUB>2</SUB> <SUP>+</SUP> ions in the afterglows of RF N<SUB>2</SUB> and N<SUB>2</SUB>–H<SUB>2</SUB> (<5%) at different positions along the downstream by emission spectroscopy. The early afterglow of N<SUB>2</SUB> changes from a pink to a late afterglow where the N+N recombination is the dominant process with the introduction of H<SUB>2</SUB>. The roles of active species such as N–atoms and N<SUB>2</SUB> <SUP>+</SUP> ions on TiO<SUB>2</SUB> surface nitriding are found to oppose to each other. We find that N atoms enhance the surface nitriding, while N<SUB>2</SUB> <SUP>+</SUP> ions are likely to deplete the surface-bound N species.</P> <P><B>Highlights</B></P> <P> <UL> <LI> Surface nitriding of TiO<SUB>2</SUB> in the N<SUB>2</SUB> RF afterglow at RT is strongly dependent on the active species densities. </LI> <LI> High density of neutral N atoms plays a beneficial role in the surface nitriding of TiO<SUB>2</SUB>. </LI> <LI> The vibrationally excited N<SUB>2</SUB> and N<SUB>2</SUB> <SUP>+</SUP> species play a negative role in the surface nitriding performance. </LI> </UL> </P>
-
-
Jeon, Byungwook,Kim, Ansoon,Ricard, André,Sarrette, Jean-Philippe,Yu, Xiaomei,Kim, Yu Kwon Elsevier BV * North-Holland 2018 Applied Surface Science Vol.432 No.2
<P><B>Abstract</B></P> <P>Surface-selective chemical modification of anatase TiO<SUB>2</SUB> nanocrystals is performed in the post-discharge region of N<SUB>2</SUB> microwave plasma and the chemical bonding states of surface nitrogen species are carefully evaluated using X-ray photoemission spectroscopy (XPS). It is found that the surface treatments in the afterglows induce the formation of stable nitrogen species at or near the surface of TiO<SUB>2</SUB>. Interestingly, the detailed bonding structure varies strongly depending on the afterglow condition. In pure N<SUB>2</SUB> afterglows, various N species with a direct TiN bond are formed on the surface, while the use of N<SUB>2</SUB>-O<SUB>2</SUB> mixtures induces the formation of additional oxidized species of NO<SUB>3</SUB> <SUP>−</SUP> on the surface. This is attributed to the high concentrations of O or NO in the afterglows of N<SUB>2</SUB>-O<SUB>2</SUB> plasmas. The incorporation of substitutional N species in the subsurface is also achieved after a prolonged exposure in the early afterglow with a high density of N<SUB>2</SUB> <SUP>+</SUP> species. Our results show that the exposure condition can be controlled for a selective chemical modification of TiO<SUB>2</SUB> surface for the control of surface properties in various applications.</P> <P><B>Highlights</B></P> <P> <UL> <LI> Selective surface nitridation of TiO<SUB>2</SUB> is performed in the afterglows of N<SUB>2</SUB> plasma. </LI> <LI> The bonding states of N vary depending on the active species in the afterglows. </LI> <LI> The O and/or NO species are responsible for the formation of nitrate on TiO<SUB>2</SUB>. </LI> </UL> </P> <P><B>Graphical abstract</B></P> <P>[DISPLAY OMISSION]</P>
연관 검색어 추천
이 검색어로 많이 본 자료
활용도 높은 자료
