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1
A non-equilibrium atmospheric pressure Capacitively-Coupled-Plasma (CCP) driven at VHF (162 MHz) for plasma catalysis of CO2 into CO

Harvey Cleo,Vandenburg S.,Ellingboe A.R. 한국물리학회 2021 Current Applied Physics Vol.28 No.-
The design of a Very-High-Frequency (VHF) 162 MHz driven atmospheric-pressure Capacitively-Coupled-Plasma (CCP), with top and bottom electrodes operated in push-pull configuration, powered via a Power-Splitting- Transmission-Line-Driver (PSTLD), is presented. Application to the reprocessing of carbon dioxide into carbon-monoxide in this "high” VHF atmospheric plasma is presented, demonstrating some behaviour of the plasma source. rf power in the system is characterized using measured current (~ 1′ s Amps peak) and voltage (~ 10′ s Volts peak) waveforms at the electrode; Both are sinusoidal confirming a glow-discharge operational condition. Analysis of Optical Emission Spectra results find a highly non-equilibrium plasma, with high vibrational temperatures (from N2) in the range ~4000 K, while gas temperature, monitored by a thermocouple at the gas outlet, remains low ~300 K, and confirmed by analysis of the N2 rotational bands. The relative density of CO produced, as a by-product of CO2 dissociation, is measured optically using N2 as an actinometer. The CO density increases with rf power and longer gas residence times in the plasma volume. The high VHF atmospheric plasma is found to operate in pure CO2 flows (no helium) with minimal gas heating for the full range of power densities (specific energy input of 0.4–2 eV per molecule) investigated.
2
A CCP-Plasma Source with Operation in the High-VHF to UHF Frequencies and Scalability to Large-Area Displays

A.R. Ellingboe 한국표면공학회 2013 한국표면공학회 학술발표회 초록집 Vol.2013 No.11
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3
Measurement of nc-Si:H film uniformity and diagnosis of plasma spatial structure produced by a very high frequency, differentially powered, multi-tile plasma source

Monaghan, E.,Yeom, G.Y.,Ellingboe, A.R. Pergamon Press [etc.] 2015 Vacuum Vol.119 No.-
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This paper presents the characterization of a very high frequency, differentially powered, capacitively coupled, multi-tile plasma source, MAMELUKE. Specifically, this work concentrates on the plasma enhanced chemical vapor deposition of nano-crystalline silicon suitable for application in thin film solar manufacturing. The use of a differentially-fed multi-tile source has several benefits, but imposes a spatial structure on the plasma. Sections of dielectric insulator between the differentially-fed tiles interrupt both the electrode structure and the local gas delivery to the plasma volume, both of which contribute to the gas phase chemistry uniformity profile. We investigate the affect of these factors on the plasma spatial structure by measuring the uniformity of deposited films. We examine films deposited using the MAMELUKE source focusing on the ability to produce uniform, high quality films over large areas, with high deposition rates. Spatially resolved measurements of film thickness and crystalline fraction are presented. These measurements are then used in combination with the known behaviors of very high frequency plasma systems established by previous research to draw conclusions regarding the behavior of plasma uniformity with changing process parameters. The measurements indicate that changes in the uniformity of film properties are primarily driven by gas phase chemistry effects. Changes in local gas phase chemistry are attributed to a combination of non uniformities in both the power and gas delivery in the MAMELUKE source.