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AISI 420 stainless steel 기판위에 D.C magnetron sputtering 법으로 제조한 TiN 박막의 특성 평가
송승우(Seungwoo Song),최한철(Hancheol Choe),김영만(Youngman Kim) 한국표면공학회 2006 한국표면공학회지 Vol.39 No.5
Titanium nitride (TiN) coatings were produced on AISI 420 stainless steel by DC magnetron sputtering of a Ti target changing the processing variables, such as the flow rate of N₂/Ar, substrate temperature and the existence of Ti interlayer between TiN coatings and substrates. The hardness and residual stress in the films were investigated using nanoindentation and a laser scanning device, respectively. The stoichiometry and surface morphology were investigated using X-Ray Diffraction and SEM. The corrosion property of the films was also s tudied using a polarization method in NaCl (0.9%) solution. Mechanical properties including hardness and residual stress were related to the ratio of N₂/Ar flow rate. The corrosion resistance also was related to the processing variables.