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Titanium Aluminium Nitride 후막의 전자-빔 조사 효과
최수현(Su-Hyeon Choe),허성보(Sung-Bo Heo),공영민(Young-Min Kong),김대일(Daeil Kim) 한국표면공학회 2020 한국표면공학회지 Vol.53 No.6
Electron beam irradiation is widely used as a type of surface modification technology to advance surface properties. In this study, the effect of electron beam irradiation on properties, such as surface hardness, wear resistance, roughness, and critical load of Titanium Aluminium nitride (TiAlN) films was investigated. TiAlN films were deposited on the SKD-61 substrate by using cathode arc ion plating. After deposition, the films were bombarded with intense electron beam for 10 minutes. The surface hardness was increased up to 4520 HV at electron irradiation energy of 1500 eV. In addition, surface root mean square (RMS) roughness of the films irradiated at 1500 eV shows the lowest roughness of 484 nm in this study.
증착 후 전자-빔 조사 에너지에 따른 질화티타늄 박막의 특성
최수현(Su-Hyeon Choe),박윤제(Yun-Je Park),김유성(Yu-Sung Kim),이인식(In-Sik Lee),김대욱(Dea-Wook Kim),차병철(Byung-Chul Cha),김대일(Daeil Kim) 한국생산제조학회 2020 한국생산제조학회지 Vol.29 No.4
In this study, the effect of electron beam irradiation on surface properties, such as hardness, adhesion, and surface roughness, of TiN films was investigated. The films were deposited on an SKD-61 substrate through cathodic arc ion plating. After deposition, the films were bombarded with an intense electron beam under incident energies of 500, 1000, and 1500 eV for 10 min. From the results, the surface hardness increased up to 3357 HVIT at 1500 eV, and the critical load increased proportionally with irradiation energy from 15.8 to 23.4 N. In addition, the surface root-mean-square roughness of the films was significantly influenced by electron irradiation. Films subjected to electron irradiation at 1500 eV exhibited the lowest roughness of 397 nm.
최수현(Su-Hyeon Choe),허성보(Sung-bo Heo),최재욱(Jea-Wook Choi),장진규(Jin-Kyu Jang),김선경(Sun-Kyung Kim),최동혁(Dong-Hyuk Choi),손동일(Dong-Il Son),김대일(Daeil Kim) 한국생산제조학회 2020 한국생산제조학회지 Vol.29 No.6
Recently, polymer surface modification has been conducted to enhance function and properties. In this study, the effect of electron beam irradiation on surface properties, such as wettability, chemical bonding state, surface roughness, hardness, critical load, and friction coefficient, of polymer coating was investigated. The polymer coating was bombarded with an intense electron beam under incident energies of 300, 600, and 900 eV for 5 min. The electron beam irradiation results showed that the contact angle was reduced as the surface converted to hydrophilic due to the formation of the carboxyl (-COOH) group. In addition, surface hardness and critical load was improved by increasing the crosslink in the polymer by electron beam irradiation.
전자빔 조사 에너지에 따른 TIO/Ag/TIO 박막의 전기적, 광학적 특성 변화
최수현(Su-Hyeon Choe),허성보(Sung-bo Heo),장진규(Jin-Kyu Jang),김현진(Hyun-Jin Kim),최재욱(Jae-Wook Choi),김유성(Yu-Sung Kim),공영민(Young-Min Kong),김대일(Daeil Kim) 한국생산제조학회 2021 한국생산제조학회지 Vol.30 No.5
The influence of electron irradiation energy on the optical and electrical properties of TIO/Ag/TIO films has been investigated. These films prepared with RF and DC magnetron sputtering; they show the lowest resistivity of 4.71 × 10<SUP>-5</SUP> Ωcm. The visible transmittance also increased with the electron irradiation energy. The film irradiated at 700 eV shows 83.71% of visible transmittance. In addition, the electron irradiated films at 700 eV show a lower RMS roughness of 63.54 nm. Comparing the figure of merit, we conclude that the visible transmittance and electrical resistivity of the films are dependent on the electron irradiation energy; moreover, the opto-electrical performance of the film is enhanced by electron irradiation.
Au 층간박막 두께에 따른 ZnO 박막의 전기광학적 특성 변화
박윤제(Yun-Je Park),최수현(Su-Hyeon Choe),김유성(Yu-Sung Kim),차병철(Byung-Chul Cha),공영민(Young-Min Gong),김대일(Daeil Kim) 한국표면공학회 2020 한국표면공학회지 Vol.53 No.3
ZnO single layer films (100 nm thick) and Au intermediated ZnO films (ZnO/Au/ZnO; ZAZ) were deposited on the glass substrate by RF and DC magnetron sputtering at room temperature and then the influence of the Au interlayer on the electrical and optical properties of the films were investigated. ZnO thin films show the visible transmittance of 90.3 % and sheet resistance of 63.2⨉10<SUP>8</SUP> Ω/□. In ZAZ films, as Au interlayer thickness increased from 6 to 10 nm, the sheet resistance decreased from 58.3⨉10<SUP>8</SUP> to 48.6 Ω/□, and the visible transmittance decreased from 84.2 to 73.9 %. From the observed results, it can be concluded that the intermediate Au thin film enhances the opto-electrical performance of ZnO films without intentional substrate heating.
전자빔 표면조사에 따른 ZnO/Ag/ZnO 박막의 전기광학적 완성도 연구
김현진(Hyun-Jin Kim),이연학(Yeon-Hak Lee),장진규(Jin-Kyu Jang),최재욱(Jae-Wook Choi),최수현(Su-Hyeon Choe),허성보(Sung-Bo Heo),김준호(Jun-Ho Kima),김대일(Daeil Kim) 한국생산제조학회 2023 한국생산제조학회지 Vol.32 No.1
Transparent ZnO/Ag/ZnO tri-layered films were deposited on a glass substrate using radio frequency and direct current magnetron sputtering. The thicknesses of the ZnO and Ag films were maintained at 30 and 10 nm, respectively, to consider the effects of electron irradiation on the optoelectrical properties of the films. XRD spectra revealed that post-deposition electron irradiated films exhibited characteristic peaks of ZnO (002) and Ag (111), respectively. The observed grain sizes of ZnO (002) and Ag (111) increased to 7.1 and 8.4 nm, respectively, under an irradiation condition of 900 eV, and the surface roughness of the electron irradiated films at 900 eV was reduced to 1.29 nm. The as-deposited films showed a figure of merit, indicating the optoelectrical performance of the films, of 4.1×10<SUP>-3</SUP> Ω<SUP>-1</SUP>, whereas the films electron irradiated at 900 eV showed a higher figure of merit of 1.1×10<SUP>-2</SUP> Ω<SUP>-1</SUP>.