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질소이온주입에 의한 Al 합금의 조직변화 및 내식성 향상에 관한 연구
엄기원(Khey W. Urm),윤주선(Joo S. Yoon),한전건(Jeon G. Han),연윤모(Yun M. Yeon) 한국진공학회(ASCT) 1995 Applied Science and Convergence Technology Vol.4 No.2
고에너지 (50~200 keV)로 가속된 이온을 모재표면에 물리적으로 투입하므로써 표면의 조성 및 조직을 변화시키는 공정인 이온주입기술을 이용하여 경량고강도소재로 각광받고 있는 Al2218 합금의 내식성 향상을 연구하였다. 질소이온주입은 DuoPIGatron 이온원을 사용하여 가속전압 100 keV, 조사량 1×10^(l7) ions/㎠~5×10^(17) ions/㎠의 조건으로 행하였으며 Al 합금의 열화를 방지하기 위하여 시편온도를 60℃ 이하로 유지하였다. 질소이온 주입재의 내식성 평가를 위하여 35% NaCl 용액에서 양극분극시험 및 5% NaCl 용액에서 염수분무시험을 행하였다. Auger Electron Spectroscopy와 Transmission Electron Microscopy을 이용하여 표면의 질화물형성 여부를 조사하였으며, Scanning Electron Microscopy을 이용하여 부식된 표면을 관찰하였다. Al2218 합금에 질소이온을 주입한 결과 표면에 미세한 AlN 석출물을 형성하였으며 이러한 질화물형성에 의해 공식(pitting) 발생을 억제하고 부식전류밀도를 감소시켜 내식성이 향상되었다. The micro structure change and corrosion behavior of nitrogen implanted Al2218 aluminium alloy has been investigated. Nitrogen implantation was carried out by using Duo-PIGatron ion source at an accelerating energy of 100 keV to total dose of 1×10^(17) ions/㎠ and 5×10^(17) ions/㎠ with current density of 40 μA/㎠. The temperature of substrate was maintained below 60℃ during implantation. The structure change of implanted layer was analyzed by AES and TEM and the corrosion behavior was evaluated by anodic polarization test in 3.5% NaCl solution and salt spray test in 5% NaCl solution. Nitrogen implantation produced fine precipitates of aluminium nitride and fairly reduced corrosion rate as well as enhanced corrosion potential. The improvement of corrosion resistance becomes effective with increasing total nitrogen ion dose. The enhancement of corrosion resistance was observed to be closely associated with AlN formation as well as irradiation damage which promotes passivation and higher pitting potential.
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Cathodic Arc Plasma Deposition 법에 의해 합성된 (TiAl) N 박막의 미세구조와 내마모특성에 관한 연구
윤주선,김형준,한전건,송건 대한금속재료학회(대한금속학회) 1996 대한금속·재료학회지 Vol.34 No.2
(TiAl)N films were deposited on high speed steel(SKH9) by Cathodic Arc Plasma Deposition employing two separate targets of Al and Ti, and the formation behaviors of the films were investigated by AES, EDX, XRD and SEM. The composition of (TiAl)N film was varied with control of current ratios of Al and Ti targets. As the Al target current increased, the atomic ratio of Al in the film increased and the hardness of (TiAl)N film was obtained to be 2200∼2700 ㎏/㎟ depending on the stoichiometry of Al and Ti in the film. The deposition of (TiAl)N film significantly enhanced the wear resistance of substrate during ball-on-disc type wear test at elevated temperatures up to 600℃. The (TiAl)N film with high density and good adhesion caused a significant reduction of friction coefficient and weight loss of substrate between Al₂O₃ ball and (TiAl)N film sliding system and the most effective improvement of wear resistance was obtained by (TiAl)N film with Al/Ti atomic ratio of 1.10.
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Arc-Magnetron 복합코팅 공정에 의해 합성된 초고경도 WC-(TiAl)N 복합화합물 코팅의 특성평가 연구
한전건,윤주선 대한금속재료학회(대한금속학회) 2000 대한금속·재료학회지 Vol.38 No.4
Multi-phase composite coating which provides mechanical properties unachievable in uniform materials is a promising technique for new hard coating development. Structural1y, multi-phase composite films tend to be dense and fine granular structure because column propagation is periodically interrupted by the nucleation of another phase. Recently, we have synthesized WC-TiN multi-phase films by cathodic arc process. The microhardness of the WC-TiN films on cemented carbide were measured to be up to 4,000 ㎏/㎟ and these values were 1.5 times as hard as that of the WC and TiN single layer. Arc spot movement on WC cathode, however, is so slow that explosive particle emissions occur, resulting in lots of macro-particles and damages on the coating surface. In this study, super-hard WC-(TiAl)N coatings were deposited by arc-magnetron hybrid process and content of WC in the films were varied with power density of WC magnetron source. Hybrid process allowed compositionally gradient WC-(TiAl)N multi-phase coatings to be deposited with low macro-particles and good adhesion. It is noted that compositionally gradient WC-(TiAl)N coatings show super hardness of 5,000 ㎏/㎟. The present study introduces the hybrid process parameters involved and the formation behavior of WC gradient WC-(TiAl)N coatings were investigated by SEM, AES and XRD.
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Arc-Magnetron 복합 코팅 공정에 의한 (TiAl)N 박막 합성에 관한 연구
한전건,윤주선,한준희 대한금속재료학회(대한금속학회) 2000 대한금속·재료학회지 Vol.38 No.3
(TiAl)N films deposited by cathodic arc process employing two separate targets of Al and Ti have lots of macro-particles on the surface. The macro-particles were found out to be generated mainly from Al cathode of low melting temperature. In the previous study, TiN films deposited with external magnetic field showed remarkable reduction of surface droplet. For the (TiAl)N coatings, however, the efficiency of Al droplet removal was not so much as TiN films. A new coating concept combining magnetron sputtering and arc evaporation for improved coating properties was made in this study. (TiAl)N and Al-gradient (TiAl)N coatings were deposited by arc-magnetron hybrid process and content of Al in the films was changed by power density of Al magnetron sputtering source. This hybrid process allowed compositionally gradient (TiAl)N coatings to be deposited with low macro-particles and excellent adhesion. It is noted that Al-gradient (TiAl)N coating showed micro hardness of 3,000 ㎏/㎟ and good adhesion of HF2 grade. The present study introduces the hybrid process parameters involved. The formation behavior of (TiAl)N and Al-gradient (TiAl)N coatings were investigated by SEM, EDX AES and XRD.
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WC-TiN 초고경도 복합재료 박막 합성 및 기계적 특성에 관한 연구
한전건,명현식,윤주선 대한금속재료학회(대한금속학회) 2000 대한금속·재료학회지 Vol.38 No.4
Composite films have been one of approaches for new hard coating development and provided properties which are unachievable in uniform materials. Structurally, composite films tended to have dense and fine granular structure because column propagation was periodically interrupted by the nucleation of another phase. In this study, WC-TiN composite films were deposited on cemented carbide substrates by cathodic arc ion plating process. The chemical compositions and crystal structures were evaluated by energy dispersive spectroscopy(EDS) and X-ray diffractometry(XRD), respectively. Film thickness and fracture morphologies were investigated by using scanning electron microscopy(SEM). The mechanical properties such as film adhension and microhardness were evaluated by scratch test, microknoop hardness test and nano indentation hardness test. The microhardness of the WC-TiN composite film on cemented carbide was measured to be 4000(㎏/㎟) which is 1.5 times higher than that of the WC and TiN single layer. The critical load(Lc) of WC-Ti/WC-TiN multi-layer film was measured to be 48.5N in scratch test.
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